POTASSIUM TARTRATE AS A COMPLEXING AGENT FOR COBALT "BUFF STEP" CMP IN ALKALINE SLURRY

被引：0
|
作者：
Liang, Tingwei [1 ]
Wang, Shengli [1 ]
Wang, Chenwei [1 ]
Liu, Fengxia [1 ]
机构：
[1] Hebei Univ Technol, Sch Elect Informat Engn, Tianjin 300130, Peoples R China
来源：
2019 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC) | 2019年
关键词：
Titanium; Cobalt; CMP; Removal ratio; Electrochemistry;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper investigates the dynamic corrosion potential differences of cobalt and titanium at different pH values and hydrogen peroxide concentrations. The effects of oxidants like hydrogen peroxide, complexing agents like Potassium tartrate (PTH) on the polishing rate of cobalt and titanium were studied. The lower galvanic corrosion potential differences were obtained, and the better polishing removal ratio was achieved.
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页数：3
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