Methyl monolayers suppress mechanical energy dissipation in micromechanical silicon resonators

被引:17
|
作者
Wang, Y [1 ]
Henry, JA [1 ]
Sengupta, D [1 ]
Hines, MA [1 ]
机构
[1] Cornell Univ, Dept Chem, Ithaca, NY 14853 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1832735
中图分类号
O59 [应用物理学];
学科分类号
摘要
The quality factor and long-term stability of megahertz-range micromechanical silicon resonators can be significantly improved by a methyl monolayer directly bonded to the silicon surface. Mechanical energy dissipation in functionalized resonators is shown to be a sensitive function of surface chemistry. At least 18% and 41% of the dissipation in H-terminated and long-chain alkyl-terminated resonators, respectively, is surface related. Surface-induced dissipation is poorly correlated with the mechanical properties of the terminating layer, but may be related to the surface defect density. (C) 2004 American Institute of Physics.
引用
收藏
页码:5736 / 5738
页数:3
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