Methyl monolayers suppress mechanical energy dissipation in micromechanical silicon resonators

被引：17

作者：

Wang, Y ^{[1
]}

Henry, JA ^{[1
]}

Sengupta, D ^{[1
]}

Hines, MA ^{[1
]}

机构：

[1] Cornell Univ, Dept Chem, Ithaca, NY 14853 USA

来源：

APPLIED PHYSICS LETTERS | 2004年 / 85卷 / 23期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1063/1.1832735

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The quality factor and long-term stability of megahertz-range micromechanical silicon resonators can be significantly improved by a methyl monolayer directly bonded to the silicon surface. Mechanical energy dissipation in functionalized resonators is shown to be a sensitive function of surface chemistry. At least 18% and 41% of the dissipation in H-terminated and long-chain alkyl-terminated resonators, respectively, is surface related. Surface-induced dissipation is poorly correlated with the mechanical properties of the terminating layer, but may be related to the surface defect density. (C) 2004 American Institute of Physics.

引用

页码：5736 / 5738

页数：3

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