The sticking of H2(ν=1, J=1) on Cu(100) measured using laser-induced thermal desorption

被引:7
|
作者
Kim, Jonghyuk [1 ]
Sitz, Greg O. [1 ]
机构
[1] Univ Texas Austin, Dept Phys, Austin, TX 78712 USA
基金
美国国家科学基金会;
关键词
sticking coefficient; hydrogen; copper; TO-STATE SCATTERING; DISSOCIATIVE CHEMISORPTION; ASSOCIATIVE DESORPTION; H-2; RECONSTRUCTION; ADSORPTION; DYNAMICS; HYDROGEN; N-2;
D O I
10.1080/00268971003630711
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The sticking of vibrationally excited H-2 on Cu(100) is measured using molecular beam techniques and stimulated Raman scattering for state preparation. Laser Induced Thermal Desorption (LITD) is developed to measure surface hydrogen coverage by calibration with known H-coverages. We find that LITD can be effectively used to measure adsorbed hydrogen concentrations with a sensitivity of better that 1% of a monolayer. Sticking coefficients of H-2 are determined from the ratio coverage to exposure. Measurements are made for H-2 incident translational energies in the range of 74-189 meV. For the first excited vibrational state, we find and an upper limit of the H-2 sticking coefficient to be 0.065 at E-i = 74 meV and 0.17 at E-i = 189 meV. These limits imply that previous measurements of loss of H-2(nu = 1) upon scattering from Cu(100) cannot be predominately a result of dissociative adsorption. The results are broadly consistent with results determined from quantum-state resolved measurements for recombinatative desorption and the principle of detailed balance for H-2 from Cu(111).
引用
收藏
页码:1027 / 1032
页数:6
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