Tensile stress-acceleration of the surface structural relaxation of SiO2 optical fibers

被引:15
|
作者
Peng, YL
Tomozawa, M [1 ]
Blanchet, TA
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Dept Mech Engn, Troy, NY 12180 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/S0022-3093(97)90139-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The surface relaxation kinetics of commercial silica optical fibers were studied by measuring the IR band positions in reflection, which are directly correlated with the Si-O-Si bond angle as well as the fictive temperature of the glass. The silica glass optical fibers were heat-treated at 650 degrees C under 355 torr water vapor pressure and dry nitrogen atmosphere with and without applied stress. It was found that the relaxation kinetics were measurably accelerated by a tensile stress in the presence of water vapor. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:376 / 382
页数:7
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