Tensile stress-acceleration of the surface structural relaxation of SiO2 optical fibers

被引：15
|
作者：
Peng, YL
Tomozawa, M [1 ]
Blanchet, TA
机构：
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Dept Mech Engn, Troy, NY 12180 USA
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1997年 / 222卷
基金：
美国国家科学基金会;
关键词：
D O I：
10.1016/S0022-3093(97)90139-3
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The surface relaxation kinetics of commercial silica optical fibers were studied by measuring the IR band positions in reflection, which are directly correlated with the Si-O-Si bond angle as well as the fictive temperature of the glass. The silica glass optical fibers were heat-treated at 650 degrees C under 355 torr water vapor pressure and dry nitrogen atmosphere with and without applied stress. It was found that the relaxation kinetics were measurably accelerated by a tensile stress in the presence of water vapor. (C) 1997 Elsevier Science B.V.
引用
收藏
页码：376 / 382
页数：7
相关论文
共 50 条
  • [1] LASER NONLINEAR-OPTICAL PROBING OF SILICON/SIO2 INTERFACES - SURFACE STRESS FORMATION AND RELAXATION
    GOVORKOV, SV
    KOROTEEV, NI
    PETROV, GI
    SHUMAY, IL
    YAKOVLEV, VV
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1990, 50 (04): : 439 - 443
  • [2] Modeling birefringence in SiO2 glass fiber using surface stress relaxation
    Hausmann, Bronson D.
    Miller, Paul A.
    Aaldenberg, Emily M.
    Blanchet, Thierry A.
    Tomozawa, Minoru
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2020, 103 (03) : 1666 - 1676
  • [3] Modeling SiO2 stress relaxation and stress dependent oxidation
    Navi, M
    Dunham, ST
    PROCEEDINGS OF THE FOURTH INTERNATIONAL SYMPOSIUM ON PROCESS PHYSICS AND MODELING IN SEMICONDUCTOR TECHNOLOGY, 1996, 96 (04): : 417 - 425
  • [4] STRUCTURAL RELAXATION EFFECTS IN DRY THERMAL SIO2
    LANDSBERGER, LM
    TILLER, WA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C136 - C136
  • [5] Surface stress relaxation in SiO2 films by plasma nitridation and nitrogen distribution in the film
    Itakura, AN
    Shimoda, M
    Kitajima, M
    APPLIED SURFACE SCIENCE, 2003, 216 (1-4) : 41 - 45
  • [6] Laser irradiation induced structural relaxation in the densified SiO2 glass and SiO2 thin film
    Tan, C.Z.
    Wu, Z.L.
    Arndt, J.
    Radiation Effects and Defects in Solids, 1995, 137 (1 -4 pt 4): : 179 - 182
  • [7] Laser irradiation induced structural relaxation in the densified SiO2 glass and SiO2 thin film
    Tan, CZ
    Wu, ZL
    Arndt, J
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1995, 137 (1-4): : 1405 - 1408
  • [8] DEFECT REACTIVATION AND STRUCTURAL RELAXATION IN DEPOSITED AMORPHOUS SIO2
    DEVINE, RAB
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (07) : 3542 - 3550
  • [9] A viscous compressible model for stress generation/relaxation in SiO2
    Navi, M
    Dunham, ST
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (01) : 367 - 371
  • [10] Radiation optical effects in commercial SiO2:Ge fibers
    Ishchenko, A. V.
    Shulgin, B. V.
    Vokhmintsev, A. S.
    Weinstein, I. A.
    Shalimov, L. N.
    Manko, N. G.
    Shtykov, A. N.
    Shestakov, G. V.
    Chistyakova, E. K.
    Shonokhova, A. A.
    INTERNATIONAL CONGRESS ON ENERGY FLUXES AND RADIATION EFFECTS (EFRE-2014), 2014, 552
12345