Atomistic simulation of dislocation interactions with a Σ=5(210) grain boundary during nanoindentation of Ni

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作者
Jang, H [1 ]
Farkas, D
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
[2] Virginia Polytech Inst & State Univ, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA
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T [工业技术];
学科分类号
08 ;
摘要
Molecular dynamics simulations of nanoindentation were performed using embedded atom potentials. The indentation was simulated on a Ni substrate using a diamond-like spherical indenter. In this study, we focused on the interaction of a Sigma=5 (210) grain boundary with the dislocations that were nucleated and expanded as loops under the indenter during nanoindentation. The results showed that dislocation loops were nucleated beneath the surface and propagated on multiple {111} slip planes. These dislocations impinged into the grain boundary in the course of nanoindentation. The lattice dislocations changed the atom configuration at the boundary region as they merged into the grain boundary and at later stages they transmitted across the grain boundary. The results also showed that the presence of a grain boundary affected the indenting speed and dislocation motion during nanoindentation, with the grain boundary retarding the indentation process.
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页码:203 / 208
页数:6
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