CH3 and Cl2 coadsorbed on Si/Cu(100)

被引：7

作者：

Han, J

Gheyas, SI

Strongin, DR ^{[1
]}

Hinch, BJ

Wright, AP

机构：

[1] Temple Univ, Dept Chem, Philadelphia, PA 19122 USA

[2] Rutgers State Univ, Dept Chem, Piscataway, NJ 08855 USA

[3] Dow Corning Corp, Midland, MI 48686 USA

来源：

CATALYSIS LETTERS | 2000年 / 68卷 / 3-4期

关键词：

X-ray photoelectron spectroscopy; temperature-programmed desorption; Rochow reaction; copper silicon; methyl; chlorine; methylchlorosilane;

D O I：

10.1023/A:1019012326536

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

X-ray photoelectron spectroscopy (XPS) and temperature-programmed desorption (TPD) studies were used to investigate the reactions of coadsorbed CH3 and Cl-2 on Si/Cu(100). TPD results showed that the individual exposure of Si/Cu(100) to CH3 and Cl-2 resulted primarily in the desorption of (CH3)(3)SiH and SiCl4, respectively. Coadsorption of CH3 and Cl-2 at specific surface concentrations on Si/Cu(100) resulted in the desorption of (CH3)(4-x)SiClx (x ranges from 1 to 3) species. The relative surface concentration of CH3 and Cl (resulting from Cl-2 dissociation), however, controlled the stoichiometry of the methylchlorosilane product. XPS results suggested that more Si was removed from the Si/Cu(100) surface as gaseous product when CH3 and Cl-2 were coadsorbed on the surface than when CH3 and Cl-2 were adsorbed alone.

引用

页码：147 / 152

页数：6

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