Electron injection-induced effects in III-nitrides

被引:0
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作者
Chernyak, L [1 ]
机构
[1] Univ Cent Florida, Orlando, FL 32816 USA
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暂无
中图分类号
R5 [内科学];
学科分类号
1002 ; 100201 ;
摘要
Application of a forward bias in GaN-based solid state devices - p-n junctions and Schottky barriers - leads to a significant increase of minority carrier diffusion length and lifetime. Consistent changes were observed in material optoelectronic properties, including spectral photoresponse, and were attributed to charging of deep metastable Mg-acceptor-related centers.
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页码:178 / 183
页数:6
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