Field emission characteristics of CuO nanowires by hydrogen plasma treatment

被引：40
|
作者：
Sung, Woo-Yong
Kim, Wal-Jun
Lee, Seung-Min
Lee, Ho-Young
Kim, Yong-Hyup
Park, Kyung-Ho
Lee, Soonil
机构：
[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
[2] Seoul Natl Univ, Inst Adv Aerosp Technol, Seoul 151742, South Korea
[3] Ajou Univ, Dept Mol Sci & Technol, Suwon 442749, South Korea
来源：
VACUUM | 2007年 / 81卷 / 07期
关键词：
field emission; cuprous oxide; nanostructures; plasma treatment; reduction;
D O I：
10.1016/j.vacuum.2006.10.002
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
CuO nanowires were formed on copper-coated silicon substrates by a wet chemical process, immersing them in a hot alkaline solution. The effect of hydrogen plasma treatment on the field emission characteristics of the CuO nanowires was investigated. The results showed that hydrogen plasma treatment enhanced the field emission characteristics of the CuO nanowires showing a decrease in turn-on voltage as well as an increase of field enhancement factor. It is believed that hydrogen plasma treatment plays an important role in the improvement of field emission characteristics of CuO emitters. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码：851 / 856
页数：6
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