Structure and mechanical properties of ZrCrAlN nanostructured thin films by closed-field unbalanced magnetron sputtering

被引：6

作者：

Kim, Youn J. ^{[1
]}

Lee, Ho Y. ^{[1
]}

Kim, Yong M. ^{[1
]}

Shin, Kyung S. ^{[1
]}

Jung, Woo S. ^{[1
]}

Han, Jeon G. ^{[1
]}

机构：

[1] Sungkyunkwan Univ, Dept Chem, Ctr Adv Plasma Surface Technol, Suwon 440746, South Korea

来源：

SURFACE & COATINGS TECHNOLOGY | 2007年 / 201卷 / 9-11期

关键词：

ZrCrAlN; nanostructured; CFUBMS;

D O I：

10.1016/j.surfcoat.2006.07.115

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Quaternary ZrCrAlN nanostructured thin films were synthesized by Closed-Field Unbalanced Magnetron Sputtering, and their microstructure and mechanical properties of the ZrCrAlN nanostructured thin films were examined. The grain refinement of the ZrCrAlN nanostructured thin films was controlled by adjusting the N-2 partial pressure. The hardness of the film varied with the N-2 partial pressure and the maximum value was approximately 45 GPa. It was also confirmed that there is a critical value of the grain size, d(c), needed to maximize the hardness. (C) 2006 Elsevier B.V. All rights reserved.

引用

页码：5547 / 5551

页数：5

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