Band edges determination of CuInS2 thin films prepared by electrodeposition

被引:33
|
作者
Martinez, AM
Arriaga, LG
Fernández, AM
Cano, U
机构
[1] Inst Invest Elect, Cuernavaca 62490, Morelos, Mexico
[2] Univ Nacl Autonoma Mexico, CIE, Dept Mat Solares, Temixco 62580, Morelos, Mexico
关键词
semiconductors; thin films; electrodeposition; X-ray diffraction;
D O I
10.1016/j.matchemphys.2004.08.009
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A CuIns(2) (CIS) semiconductor thin film was growth by electrodeposition on a stainless steel substrate. In order to improve the polycrystallinity the samples were annealed in a N-2 atmosphere. The films were characterized by electrochemical techniques and X ray diffraction and their band gaps were determined by photocurrent spectroscopy. When the electrolytic bath has the same concentration [Cu2+] = [In3+] the resulting film was of the n-type, while for different concentrations of Cu and In ions the film was of the p-type. A depletion zone during capacitance-voltage measurements at 10 kHz frequency was seen over the voltage range used. Using C-V plots in the depletion zone, flat-band potentials and the energetic position of band edges were calculated. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:417 / 420
页数:4
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