Hall effect in Fe-Cr-Co alloy thin films

被引：2

作者：

Chang, HC ^{[1
]}

Chang, YH ^{[1
]}

Yao, SY ^{[1
]}

机构：

[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 70101, Taiwan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 01期

关键词：

Hall effect; ion beam sputtering; Hall coefficient; high resolution transmission electron microscope; Hall resistivity; extraordinary Hall effects;

D O I：

10.1143/JJAP.37.151

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This paper presents the Hall effect and microstructure of Fe-XCr-10Co, Fe-XCr-Co (weight ratio W-Fe/W-Co = 1), and Fe-60Cr-XCo alloy films. After deposition by ion beam sputtering (BS), the Hall voltage (VH) and Hall coefficient (RH) values of the as-deposited films were found to be small. After heat treatment, phase separation into eel (ferromagnetic phase) and alpha(2) (paramagnetic phase) was observed and verified by high resolution transmission electron microscope (HRTEM). By aging the Fe-60Cr-15Co films at 550 degrees C for 80 min, we found the maximum Hall resistivity (pH) and Hall voltage (VH) values which are 30 mu Omega-cm and 1.2mV, respectively (measured at 77 K and 14kOe). The extraordinary Hall coefficient (R-S) is about 0.408 cm(3)/C. The Hall coefficient is positive for both as-deposited and annealed films. The alloy composition and heat treatment condition which influence film's microstructure obviously affect the Hall property.

引用

页码：151 / 156

页数：6

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