Negative electron affinity group III-nitride photocathode demonstrated as a high performance electron source

被引:47
|
作者
Machuca, F [1 ]
Liu, Z
Maldonado, JR
Coyle, ST
机构
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[2] ETEC Syst Inc, Hayward, CA 94545 USA
[3] Stanford Univ, Dept Phys, Stanford, CA 94305 USA
[4] Stanford Univ, Stanford Synchrotron Radiat Lab, Stanford, CA 94305 USA
来源
关键词
D O I
10.1116/1.1813453
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The need for a high performance (low energy spread < 0.5 eV. long lifetime > 3 months per spot, emission stability < 1% /h) electron source continues as part of the development of new e-beam writing and inspection tools. We present measurements from a group III-nitride (indium gallium nitride) photocathode in a demountable vacuum system to measure energy spread. lifetime. and preliminary blanking effects. We show the results of cathodes operating in ultrahigh vacuum (UHV), high vacuum (HV), and oxygen-rich backpressures. Our results show InGaN has a longitudinal energy spread of <300 meV in reflection mode, flat lifetimes of 60 h per illuminated spot where the yield changes by <10%, and stable emission with typical recoveries within 99% of original photocurrent for all blanking periods and vacuum conditions tested (0.5 to 10 min periods). (C) 2004 American Vacuum Society.
引用
收藏
页码:3565 / 3569
页数:5
相关论文
共 50 条
  • [1] Preparation of Negative Electron Affinity Gallium Nitride Photocathode
    Qiao, Jianliang
    Chang, Benkang
    Qian, Yunsheng
    Du, Xiaoqing
    Zhang, Yijun
    Wang, Xiaohui
    5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY, 2010, 7658
  • [2] Photoemission lifetime of a negative electron affinity gallium nitride photocathode
    Nishitani, Tomohiro
    Tabuchi, Masao
    Amano, Hiroshi
    Maekawa, Takuya
    Kuwahara, Makoto
    Meguro, Takashi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2014, 32 (06):
  • [3] Prospect for high brightness III-nitride electron emitter
    Machuca, F
    Sun, Y
    Liu, Z
    Ioakeimidi, K
    Pianetta, P
    Pease, RFW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3042 - 3046
  • [4] Progress of negative electron affinity GaN photocathode
    Fu Xiao-Qian
    Chang Ben-Kang
    Li Biao
    Wang Xiao-Hui
    Qiao Jian-Liang
    ACTA PHYSICA SINICA, 2011, 60 (03)
  • [5] The evaluation system of Negative Electron Affinity photocathode
    Fu, RG
    Chang, BK
    Qian, YS
    Wang, GH
    Zong, ZY
    APOC 2001: ASIA-PACIFIC OPTICAL AND WIRELESS COMMUNICATIONS: OPTOELECTRONICS, MATERIALS, AND DEVICES FOR COMMUNICATIONS, 2001, 4580 : 614 - 622
  • [6] Studies of electron trapping in III-nitride semiconductors
    Lopatiuk, Olena
    Osinsky, Andrei
    Chernyak, Leonid
    GALLIUM NITRIDE MATERIALS AND DEVICES, 2006, 6121
  • [7] Activation mechanism of negative electron affinity GaN photocathode
    Qiao Jian-Liang
    Tian Si
    Chang Ben-Kang
    Du Xiao-Qing
    Gao Pin
    ACTA PHYSICA SINICA, 2009, 58 (08) : 5847 - 5851
  • [8] Surface Cleaning for Negative Electron Affinity GaN Photocathode
    Qiao, Jianliang
    Yin, Yingpeng
    Gao, Youtang
    Niu, Jun
    Qian, Yunsheng
    Chang, Benkang
    6TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR SENSING, IMAGING, AND SOLAR ENERGY, 2012, 8419
  • [9] Photoemission stability of negative electron affinity GaN photocathode
    Zhang Junju
    Wang Xiaohui
    Yang Wenzheng
    Tang Weidong
    Fu Xiaoqian
    Li Biao
    Chang Benkang
    OPTOELECTRONIC DEVICES AND INTEGRATION IV, 2012, 8555
  • [10] Negative thermal expansion of group III-Nitride monolayers
    Sarikurt, Sevil
    Abdullahi, Yusuf Zuntu
    Durgun, Engin
    Ersan, Fatih
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2022, 55 (31)