Modelling energy deposition in polymethyl methacrylate with low-energy electron irradiation

被引:0
|
作者
Wang, Fang [1 ]
Li, Dong-Jie [1 ]
Li, Xiao-Jun [2 ]
Cui, Wan-Zhao [2 ]
Hu, Tian-Cun [2 ]
Cao, Meng [1 ]
机构
[1] Xi An Jiao Tong Univ, Sch Elect Sci & Engn, Key Lab Phys Elect & Devices, Minist Educ, Xian 710049, Shaanxi, Peoples R China
[2] China Acad Space Technol Xian, Natl Key Lab Sci & Technol Space Microwave, Xian 710100, Peoples R China
关键词
Energy deposition; Inelastic scattering; Polymethyl methacrylate; Monte Carlo simulation; MONTE-CARLO CALCULATIONS; MEAN FREE-PATH; STOPPING POWERS; SECONDARY ELECTRONS; ORGANIC-COMPOUNDS; RANGE; EMISSION; SOLIDS; PMMA;
D O I
10.1016/j.micron.2022.103232
中图分类号
TH742 [显微镜];
学科分类号
摘要
Energy deposition in dielectric materials by electron irradiation is important in evaluating irradiation effects in various applications. Herein, we developed a novel Monte Carlo model to calculate the actual distribution of energy deposition in polymethyl methacrylate (PMMA) by simulating low-energy electron transport, including secondary electron cascades. We compared the energy deposition calculated using this model with the distri-bution of energy loss based on the continuous slowing down approximation (CSDA). The difference in depth distribution between energy deposition and energy loss near the surface is attributed to the secondary electron emission. The characteristics of energy deposition distributions at various incident angles and primary energy were analysed. Energy depositions based on different energy loss mechanisms were classified. Approximately half of the total energy deposition was formed in paths of the secondary cascade at keV-electron irradiation. The temporal properties of energy deposition show that the fast process of energy deposition occurs first near the surface of the dielectric material, then deep inside and 1-keV electrons deposit their energy in 10(-14) s.
引用
收藏
页数:9
相关论文
共 50 条
  • [41] Energy distribution of strongly nonequilibrium charge carriers in tungsten and platinum under low-energy electron irradiation
    Panchenko, OF
    Panchenko, LK
    JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS, 1998, 43 (10) : 1186 - 1191
  • [42] Low-energy electron-beam effects on poly(methyl methacrylate) resist films
    Bermudez, VM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2512 - 2518
  • [43] Monolayer Graphene Platform for the Study of DNA Damage by Low-Energy Electron Irradiation
    Sidorov, Anton N.
    Orlando, Thomas M.
    JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2013, 4 (14): : 2328 - 2333
  • [44] The kinetics of CaF2 metallization induced by low-energy electron irradiation
    Huisinga, M
    Bouchaala, N
    Bennewitz, R
    Kotomin, EA
    Reichling, M
    Kuzovkov, VN
    von Niessen, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 141 (1-4): : 79 - 84
  • [45] Low-Energy Electron Irradiation Damage in Few-Monolayer Pentacene Films
    Tebyani, A.
    Baalbergen, F.B.
    Tromp, R.M.
    van der Molen, S.J.
    Journal of Physical Chemistry C, 2021, 125 (47): : 26150 - 26156
  • [46] OPTICAL-WAVEGUIDES FORMED BY LOW-ENERGY ELECTRON-IRRADIATION OF SILICA
    HOUGHTON, AJ
    TOWNSEND, PD
    APPLIED PHYSICS LETTERS, 1976, 29 (09) : 565 - 566
  • [47] Processing and electric property control of carbon nanotubes by low-energy electron irradiation
    NTT Basic Research Laboratories, Atsugi-shi, 243-0198, Japan
    NTT Tech. Rev., 2006, 11 (25-30):
  • [48] Low-energy electron irradiation assisted diffusion of gold nanoparticles in polymer matrix
    Deore, Avinash V.
    Bhoraskar, V. N.
    Dhole, S. D.
    RADIATION PHYSICS AND CHEMISTRY, 2014, 96 : 97 - 100
  • [49] EFFECT OF LOW-ENERGY ELECTRON IRRADIATION OF METAL-OXIDE-SEMICONDUCTOR STRUCTURES
    SZEDON, JR
    SANDOR, JE
    APPLIED PHYSICS LETTERS, 1965, 6 (09) : 181 - &
  • [50] Facile micropatterning of mesoporous titania film by low-energy electron beam irradiation
    Hozumi, Atsushi
    Cheng, Dalton F.
    MATERIALS CHEMISTRY AND PHYSICS, 2011, 129 (1-2) : 464 - 470