Magnetic reversal of ion beam patterned Co/Pt multilayers

被引：13
|
作者：
Kusinski, GJ
Krishnan, KM
Denbeaux, G
Thomas, G
机构：
[1] MMFX Technol, R&D, Irvine, CA 92606 USA
[2] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Sci Mat, Berkeley, CA 94720 USA
[4] Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98195 USA
来源：
SCRIPTA MATERIALIA | 2003年 / 48卷 / 07期
关键词：
multilayers; magnetic imaging; magnetic domains; transmission X-ray microscopy; transmission electron microscopy;
D O I：
10.1016/S1359-6462(02)00607-3
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The characteristics of the reversal processes of magnetic arrays fabricated by ion-irradiation of Co/Pt multilayers with perpendicular magnetic anisotropy are reported. Magnetic patterns with periodicities from 1 mum to 100 nm were patterned. A correlation between the pattern size, magnetic reversal and grain size is presented. (C) 2003 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：949 / 954
页数：6
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