Reversal of patterned Co/Pd multilayers with graded magnetic anisotropy
被引:14
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作者:
Davies, J. E.
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NVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Natl Inst Stand & Technol, Magnet Mat Grp, Div Met, Gaithersburg, MD 20899 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Davies, J. E.
[1
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Morrow, P.
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Natl Inst Stand & Technol, Magnet Mat Grp, Div Met, Gaithersburg, MD 20899 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Morrow, P.
[2
]
Dennis, C. L.
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Natl Inst Stand & Technol, Magnet Mat Grp, Div Met, Gaithersburg, MD 20899 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Dennis, C. L.
[2
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Lau, J. W.
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Natl Inst Stand & Technol, Magnet Mat Grp, Div Met, Gaithersburg, MD 20899 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Lau, J. W.
[2
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McMorran, B.
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Natl Inst Stand & Technol, Ctr Nanoscale Sci & Technol, Gaithersburg, MD 20899 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
McMorran, B.
[3
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Cochran, A.
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Natl Inst Stand & Technol, Ctr Nanoscale Sci & Technol, Gaithersburg, MD 20899 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Cochran, A.
[3
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Unguris, J.
[3
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Dumas, R. K.
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Univ Calif Davis, Dept Phys, Davis, CA 95616 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Dumas, R. K.
[4
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Greene, P.
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Univ Calif Davis, Dept Phys, Davis, CA 95616 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Greene, P.
[4
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Liu, Kai
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Univ Calif Davis, Dept Phys, Davis, CA 95616 USANVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
Liu, Kai
[4
]
机构:
[1] NVE Corp, Adv Technol Grp, Eden Prairie, MN 55344 USA
[2] Natl Inst Stand & Technol, Magnet Mat Grp, Div Met, Gaithersburg, MD 20899 USA
[3] Natl Inst Stand & Technol, Ctr Nanoscale Sci & Technol, Gaithersburg, MD 20899 USA
[4] Univ Calif Davis, Dept Phys, Davis, CA 95616 USA
Magnetization reversal and the effect of patterning have been investigated in full-film and dot arrays of Co/Pd multilayers, using the first-order reversal curve and scanning electron microscopy with polarization analysis techniques. The effect of patterning is most pronounced in low sputtering pressure films, where the size of contiguous domains is larger than the dot size. Upon patterning, each dot must have its own domain nucleation site and domain propagation is limited within the dot. In graded anisotropy samples, the magnetically soft layer facilitates the magnetization reversal, once the reverse domains have nucleated. (C) 2011 American Institute of Physics. [doi:10.1063/1.3554256]
机构:
Development and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan
Koda, Tetsunori
Awano, Hiroyuki
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Development and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan
Awano, Hiroyuki
Hieda, Hiroyuki
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Storage Materials and Devices Laboratory, Corporate Research and Development Center, Toshiba Corp., Kawasaki 212-8582, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan
Hieda, Hiroyuki
Naito, Katsuyuki
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Storage Materials and Devices Laboratory, Corporate Research and Development Center, Toshiba Corp., Kawasaki 212-8582, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan
Naito, Katsuyuki
Kikitsu, Akira
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Storage Materials and Devices Laboratory, Corporate Research and Development Center, Toshiba Corp., Kawasaki 212-8582, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan
Kikitsu, Akira
Matsumoto, Takuya
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机构:
Central Research Laboratory, Hitachi, Ltd., Kokubunji 185-8601, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan
Matsumoto, Takuya
Nakamura, Kimio
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Central Research Laboratory, Hitachi, Ltd., Kokubunji 185-8601, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan
Nakamura, Kimio
Nishida, Tetsuya
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机构:
Central Research Laboratory, Hitachi, Ltd., Kokubunji 185-8601, JapanDevelopment and Technology Division, Hitachi Maxell, Ltd., Tsukubamirai 300-2496, Japan