Architectured columns with a metal-dielectric periodic nanostructure

被引:1
|
作者
Martin, Nicolas [1 ]
Cacucci, Arnaud [2 ]
Potin, Valerie [2 ]
Imhoff, Luc [2 ]
Nyberg, Tomas [3 ]
机构
[1] Univ Franche Comte, Inst FEMTO ST, UMR 6174, CNRS,ENSMM,UTBM, 15B Ave Montboucons, F-25030 Besancon, France
[2] Univ Bourgogne, CNRS, UMR 6303, ICB Lab Interdisciplinaire Carnot Bourgogne, 9 Ave Alain Savary, F-21078 Dijon, France
[3] Uppsala Univ, Angstrom Lab, Solid State Elect, Box 534, S-75121 Uppsala, Sweden
关键词
Deposition; Sputtering; Multilayer structure; Thin films; GLANCING ANGLE DEPOSITION; ELECTRICAL-PROPERTIES; THIN-FILMS; INTERDEPENDENCE; FERROMAGNETISM; FABRICATION;
D O I
10.1016/j.matlet.2016.02.161
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We engineer a sputter deposited metal/oxide periodic structure based on W and Ta, and corresponding oxides with tuneable alternations from a few nanometers to a few tens nanometers, combined with the preparation of inclined, zigzag and spiral columns. This work shows how bi-component periodic multilayers can be produced within some inclined nano-columns exhibiting oriented, zigzag and helix structures. This unique combination of controlled columnar structure and periodic multilayers enables new opportunities to create some unusual structural designs for functional materials. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:128 / 131
页数:4
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