Determination of the coincidence lattice of an ultra thin Al2O3 film on Ni3Al(111)

被引：72
|
作者：
Degen, S [1 ]
Krupski, A [1 ]
Kralj, M [1 ]
Langner, A [1 ]
Becker, C [1 ]
Sokolowski, M [1 ]
Wandelt, K [1 ]
机构：
[1] Inst Physikal & Theoret Chem, D-53115 Bonn, Germany
来源：
SURFACE SCIENCE | 2005年 / 576卷 / 1-3期
关键词：
aluminum; nickel; aluminum oxide; thin film; coincidence lattice; STM; SPA-LEED;
D O I：
10.1016/j.susc.2004.12.020
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Spot profile analysis low energy electron diffraction (SPA-LEED) and low temperature scanning tunneling microscopy (LT-STM) measurements were performed on an ultra thin alumina film grown at 1000 K in an oxygen atmosphere on Ni3Al(111). By the aid of these two experimental techniques it has been shown that the alumina film exhibits a large superstructure with a lattice constant of 4.16 nm. The unit cell of this superstructure has a commensurate (root67 x root67)R47.784degrees relation to the Ni3Al(1 1 1) substrate lattice. (C) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：L57 / L64
页数：8
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