UTA versus line emission for EUVL: studies on xenon emission at the NIST EBIT

被引:48
|
作者
Fahy, K [1 ]
Dunne, P
McKinney, L
O'Sullivan, G
Sokell, E
White, J
Aguilar, A
Pomeroy, JM
Tan, JN
Blagojevic, B
LeBigot, EO
Gillaspy, JD
机构
[1] Natl Univ Ireland Univ Coll Dublin, Dept Expt Phys, Dublin 4, Ireland
[2] Natl Inst Stand & Technol, Atom Phys Div, Gaithersburg, MD 20899 USA
[3] Univ Paris 06, F-75252 Paris, France
[4] Ecole Normale Super, F-75252 Paris, France
关键词
D O I
10.1088/0022-3727/37/23/003
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spectra from xenon ions have been recorded at the NIST electron beam ion trap (EBIT) and the emission into a 2% bandwidth at 13.5 nm arising from 4d --> 5p transitions compared with those from 4d --> 4f and 4p --> 4d transitions in Xe XI and also with that obtained from the unresolved transition array (UTA) observed to peak just below I I nm. It was found that an improvement of a factor of 5 could be gained in photon yield using the UTA rather than the 4d --> 5p emission. The results are compared with atomic structure calculations and imply that a significant gain in efficiency should be obtained using tin, in which the emission at 13.5 nm comes from a similar UTA, rather than xenon, as an EUVL source material.
引用
收藏
页码:3225 / 3232
页数:8
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