Process window metrology

被引：15

作者：

Ausschnitt, CP ^{[1
]}

Chu, W ^{[1
]}

Hadel, H ^{[1
]}

Ho, H ^{[1
]}

Talvi, P ^{[1
]}

机构：

[1] IBM Corp, Semicond Res & Dev Ctr, Hopewell Junction, NY 12533 USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV | 2000年 / 3998卷

关键词：

lithography control; process window; optical metrology; critical dimension;

D O I：

10.1117/12.386468

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper is the third of a series that defines a new approach to in-line lithography control. The first paper described the use of optically measurable line-shortening I Ih targets to enhance signal-to-noise and reduce measurement time.(1) The second described the dual-tone optical critical dimension (OCD) measurement and analysis necessary to distinguish dose and defocus.(2) Here we describe the marriage of dual-tone OCD to SEM-CD metrology that comprises what we call "process window metrology" (PWM), the means to locate each measured site in dose and focus space relative to the allowed process window. PWM provides in-line process tracking and control essential to the successful implementation of low-k lithography.

引用

页码：158 / 166

页数：9

共 50 条

[21] Metrology Challenges for In line Process Control
Leray, Philippe
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI, 2017, 10145
[22] Veeco eyes process metrology expansion
Hand, AJ
PHOTONICS SPECTRA, 1998, 32 (04) : 63 - 63
[23] Metrology limits of mask process development
Nesladek, Pavel
Wiswesser, Andreas
Sass, Bjoern
Richter, Jan
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII, PTS 1 AND 2, 2006, 6283
[24] Process control through integrated metrology
Butler, SW
SOLID STATE TECHNOLOGY, 1999, 42 (01) : 33 - +
[25] Metrology process assurance system METPAS©
Enke, RS
METROLOGY - AT THE THRESHOLD OF THE CENTURY ARE WE READY?, 1999, : 887 - 905
[26] Process metrology for ultrathin gate dielectrics
Rudolph Technologies, Flanders, NJ, United States
Semiconductor International, 2001, 24 (09) : 79 - 90
[27] Process complexity fuels: Integrated metrology
Braun, Alexander E.
Semiconductor International, 2005, 28 (08) : 54 - 61
[28] The 13th Metrology Symposium in Hanover as a window on current research
Garbe, H
TECHNISCHES MESSEN, 2000, 67 (04): : 143 - 143
[29] Expanding the printing process window
Indium Corp of America, Utica, United States
SMT Surf Mount Technol Mag, 4 (05):
[30] OPENING THE WINDOW TO YOUR PROCESS
TELFORD, L
CONTROL AND INSTRUMENTATION, 1984, 16 (10): : 55 - &

← 1 2 3 4 5 →