Comparison of Ta2O5 thin films deposited by "off-axis" and "on-axis" pulsed laser deposition technique

被引：2
|
作者：
Ninomiya, T [1 ]
Inoue, N [1 ]
Kashiwabara, S [1 ]
机构：
[1] Natl Def Acad, Dept Elect Engn, Yokosuka, Kanagawa 2398686, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 5A期
关键词：
tantalum pentoxide (Ta2O5); pulsed laser deposition (PLD); laser ablation; dielectric constant; droplet; off-axis method; thin film;
D O I：
10.1143/JJAP.39.2756
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The crystalline properties of Ta2O5 thin films deposited by an off-axis aperture-installation-type pulsed laser deposition (PLD) technique are investigated and the results are compared to those of films deposited by the conventional on-axis technique. When the repetition frequency is lowered, the X-ray diffraction intensity of (001) peak increases in both films. This tendency, however, is more pronounced in the off-axis films. The dielectric constant of off-axis films fabricated at 20 Hz indicates a high value of about 40, and is higher than the measured value of bulk Ta2O5. Therefore, it is concluded that the off-axis aperture-installation-type pulsed laser deposition technique is effective not only for decreasing the density of droplets, but also for obtaining high-quality crystalline films.
引用
收藏
页码：2756 / 2760
页数：5
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