Water based I-line projection lithography of PEDOT

被引：8

作者：

Touwslager, FJ ^{[1
]}

Willard, NP ^{[1
]}

de Leeuw, DM ^{[1
]}

机构：

[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands

来源：

SYNTHETIC METALS | 2003年 / 135卷 / 1-3期

关键词：

solution processing; scanning tunneling microscopy; polythiophene and derivatives; conductivity;

D O I：

10.1016/S0379-6779(02)00656-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Structured conducting thin layers of poly(3,4-ethylenedioxythiophene) (PEDOT) have been made by photosensitizing a PEDOT latex which is stabilized with polystyrene sulphonic acid (PSS). The process is based on waterborne solutions only and makes use of negatively acting, highly sensitive, lithography with UV light of 365 nm (1-line). The minimum feature size obtained is 1 mum spacings and 2.5 mum lines with a sheet resistance of about 1 kOhm/square. The environmentally acceptable technology has been demonstrated with functional all-polymer integrated circuits prepared on 150-mm wafers.

引用

页码：53 / 54

页数：2

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