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- [4] Extension of the chemical reaction scheme in DSMC method and application to the LPCVD processes [J]. Nippon Kikai Gakkai Ronbunshu, B Hen/Transactions of the Japan Society of Mechanical Engineers, Part B, 2002, 68 (667): : 689 - 695
- [5] Feature length-scale modeling of LPCVD and PECVD MEMS fabrication processes [J]. NSTI NANOTECH 2004, VOL 2, TECHNICAL PROCEEDINGS, 2004, : 239 - 242
- [6] Feature length-scale modeling of LPCVD and PECVD MEMS fabrication processes [J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2005, 12 (1-2): : 137 - 142
- [7] Feature length-scale modeling of LPCVD and PECVD MEMS fabrication processes [J]. Microsystem Technologies, 2005, 12 : 137 - 142
- [8] Simulation and inverse modeling of TEOS deposition processes using a fast level set method [J]. SISPAD 2002: INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES, 2002, : 191 - 194
- [9] A LEVEL SET METHOD FOR SIMULATION OF RISING BUBBLE [J]. Journal of Hydrodynamics, 2004, (04) : 379 - 385
- [10] A LEVEL SET METHOD FOR SIMULATION OF RISING BUBBLE [J]. JOURNAL OF HYDRODYNAMICS, 2004, 16 (04) : 379 - 385