Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

被引:341
|
作者
Wang, JJ [1 ]
Zhu, MY [1 ]
Outlaw, RA [1 ]
Zhao, X [1 ]
Manos, DM [1 ]
Holloway, BC [1 ]
机构
[1] Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
关键词
graphite; graphitic carbon; chemical vapor deposition;
D O I
10.1016/j.carbon.2004.06.035
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An ultrathin sheet-like carbon nanostructure, carbon nanosheet, has been effectively synthesized with CH4 diluted in H-2 by an inductively coupled radio-frequency plasma enhanced chemical vapor deposition. Nanosheets were obtained without catalyst over a wide range of deposition conditions and on a variety of substrates, including metals, semiconductors and insulators. Scanning electron microscopy shows that the sheet-like structures stand on edge on the substrate and have corrugated surfaces. The sheets are 1 nm or less in thickness and have a defective graphite structure. Raman spectra show typical carbon features with D and G peaks at 1350 and 1580 cm(-1), respectively. The intensity ratio of these two peaks, I(D)/I(G), increases with methane concentration or substrate temperature, indicating that the crystallinity of the nanosheets decreases. Infrared and thermal desorption spectroscopies reveal hydrogen incorporation into the carbon nanosheets. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:2867 / 2872
页数:6
相关论文
共 50 条
  • [41] Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition
    Hiramatsu, Mineo
    Nihashi, Yuki
    Kondo, Hiroki
    Hori, Masaru
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (01)
  • [42] Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition
    Hadar MANISLEVY
    Tsachi LIVNEH
    Ido ZUKERMAN
    Moshe HMINTZ
    Avi RAVEH
    [J]. Plasma Science and Technology., 2014, 16 (10) - 959
  • [43] Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition
    Hadar MANIS-LEVY
    Tsachi LIVNEH
    Ido ZUKERMAN
    Moshe H.MINTZ
    Avi RAVEH
    [J]. Plasma Science and Technology, 2014, (10) : 954 - 959
  • [44] Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition
    Manis-Levy, Hadar
    Livneh, Tsachi
    Zukerman, Ido
    Mintz, Moshe H.
    Raveh, Avi
    [J]. PLASMA SCIENCE & TECHNOLOGY, 2014, 16 (10): : 954 - 959
  • [45] SAMPLE INTRODUCTION INTO THE INDUCTIVELY COUPLED PLASMA BY A RADIO-FREQUENCY ARC
    FARNSWORTH, PB
    HIEFTJE, GM
    [J]. ANALYTICAL CHEMISTRY, 1983, 55 (08) : 1414 - 1417
  • [46] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE IN A CAPACITIVELY COUPLED RADIO-FREQUENCY DISCHARGE
    LAIMER, J
    STORI, H
    RODHAMMER, P
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (05): : 2952 - 2959
  • [47] Co-synthesis of vertical graphene nanosheets and high-value gases using inductively coupled plasma enhanced chemical vapor deposition
    Yang, Jian
    Xu, Ruiyang
    Wu, Angjian
    Li, Xiaodong
    Li, Li
    Shen, Wangjun
    Yan, Jianhua
    [J]. PLASMA SCIENCE & TECHNOLOGY, 2018, 20 (12):
  • [48] A Stochastic Spray Model for the Radio-Frequency Inductively Coupled Plasma
    Shan, Yanguang
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2009, 37 (09) : 1747 - 1753
  • [49] Characterization of a radio-frequency inductively coupled electrothermal plasma thruster
    Lafleur, T.
    Corr, C. S.
    [J]. JOURNAL OF APPLIED PHYSICS, 2021, 130 (04)
  • [50] Co-synthesis of vertical graphene nanosheets and high-value gases using inductively coupled plasma enhanced chemical vapor deposition
    杨健
    许睿飏
    吴昂键
    李晓东
    李澧
    沈望俊
    严建华
    [J]. Plasma Science and Technology, 2018, (12) : 90 - 99