Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source

被引：9
|
作者：
Hong, Seung Pyo [1 ]
Lim, Jong Hyeuk [1 ]
Gweon, Gwang Ho [1 ]
Yeom, Geun Young [2 ]
机构：
[1] Sungkyunkwan Univ, Dept Mat Sci & Engn, Suwon 440746, Kyunggi Do, South Korea
[2] Sungkyunkwan Adv Inst Nano Technol NCRC, Suwon 440746, Kyunggi Do, South Korea
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 08期
关键词：
D O I：
10.1143/JJAP.49.080217
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The effect of C-shaped ferrite modules installed above a spiral-type inductively coupled plasma (ICP) antenna coil and the plasma characteristics of an ICP source operated at 2 MHz were investigated in order to realize 450 mm wafer processing The application of an appropriate amount of Ni-Zn ferrite modules to the antenna increased the plasma density slightly and decreased the plasma potential, while the application of the ferrite modules all over the antenna line decreased the plasma density and increased the plasma potential In particular, by installing the ferrite modules locally in a low-plasma-density region, plasma uniformity was improved effectively (C) 2010 The Japan Society of Applied Physics
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