Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source

被引：9
|
作者：
Hong, Seung Pyo [1 ]
Lim, Jong Hyeuk [1 ]
Gweon, Gwang Ho [1 ]
Yeom, Geun Young [2 ]
机构：
[1] Sungkyunkwan Univ, Dept Mat Sci & Engn, Suwon 440746, Kyunggi Do, South Korea
[2] Sungkyunkwan Adv Inst Nano Technol NCRC, Suwon 440746, Kyunggi Do, South Korea
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 08期
关键词：
D O I：
10.1143/JJAP.49.080217
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The effect of C-shaped ferrite modules installed above a spiral-type inductively coupled plasma (ICP) antenna coil and the plasma characteristics of an ICP source operated at 2 MHz were investigated in order to realize 450 mm wafer processing The application of an appropriate amount of Ni-Zn ferrite modules to the antenna increased the plasma density slightly and decreased the plasma potential, while the application of the ferrite modules all over the antenna line decreased the plasma density and increased the plasma potential In particular, by installing the ferrite modules locally in a low-plasma-density region, plasma uniformity was improved effectively (C) 2010 The Japan Society of Applied Physics
引用
收藏
页数：3
相关论文
共 50 条
  • [1] Development of Ferrite-Enhanced Side-Type Inductively Coupled Plasma
    Bang, Jin-Young
    Chung, ChinWook
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) : 2510 - 2511
  • [2] Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module
    Jong Hyeuk Lim
    Kyong Nam Kim
    Min Hwan Jeon
    Jong Tae Lim
    Geun Young Yeom
    [J]. Plasma Chemistry and Plasma Processing, 2011, 31 : 507 - 515
  • [3] Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module
    Lim, Jong Hyeuk
    Kim, Kyong Nam
    Jeon, Min Hwan
    Lim, Jong Tae
    Yeom, Geun Young
    [J]. PLASMA CHEMISTRY AND PLASMA PROCESSING, 2011, 31 (03) : 507 - 515
  • [4] Characteristics of plasma using a ferromagnetic enhanced inductively coupled plasma source
    Kim, Kyong Nam
    Lim, Jong Hyeuk
    Park, Jung Kyun
    Lim, Jong Tae
    Yeom, Geun Young
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (09) : 7339 - 7342
  • [5] Characteristics of plasma using a ferromagnetic enhanced inductively coupled plasma source
    Kim, Kyong Nam
    Lim, Jong Hyeuk
    Park, Jung Kyun
    Lim, Jong Tae
    Yeom, Geun Young
    [J]. Japanese Journal of Applied Physics, 2008, 47 (9 PART 1): : 7339 - 7342
  • [6] Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source
    Hua, Yue
    Song, Jian
    Hao, Zeyu
    Ren, Chunsheng
    [J]. PLASMA SCIENCE & TECHNOLOGY, 2018, 20 (06)
  • [7] Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source
    滑跃
    宋健
    郝泽宇
    任春生
    [J]. Plasma Science and Technology, 2018, 20 (06) : 48 - 55
  • [8] Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source
    滑跃
    宋健
    郝泽宇
    任春生
    [J]. Plasma Science and Technology, 2018, (06) : 48 - 55
  • [9] Ferrite-Enhanced U-Shaped Internal Antenna for Large-Area Inductively Coupled Plasma System
    Kim, Kyong Nam
    Lim, Jong Hyeuk
    Lim, Woong Sun
    Yeom, Geun Young
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2010, 38 (02) : 133 - 136
  • [10] Characteristics of internal inductively coupled plasma with a ferrite module
    Lim, Jong Hyeuk
    Kim, Kyong Nam
    Gwon, Gwang Ho
    Hong, Seng Pyo
    Kim, Seok Hwan
    Yeom, Geun Young
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (09)
12345