Effect of voltage divider layer on self-current compliance resistive switching in Ta/TaOx/ITO structure with an ultra-low power consumption

被引:10
|
作者
Zhao, Jinshi [1 ]
Guo, Shuqin [1 ]
Li, Jiacheng [1 ]
Li, Yingchen [1 ]
Zhou, Liwei [1 ]
机构
[1] Tianjin Univ Technol, Sch Elect & Elect Engn, Tianjin Key Lab Film Elect & Commun Devices, 391 Bin Shui Xi Dao Rd, Tianjin 300384, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/5.0036730
中图分类号
O59 [应用物理学];
学科分类号
摘要
Based on the Ta/TaOx/ITO structure, self-current compliance behavior in the resistive switching (RS) properties was investigated. The formation and rupture of metallic indium (In) conducting filaments (CFs), which contributes to the RS in this device, are confirmed by the variable temperature electrical test combined with X-ray photoelectron spectroscopy (XPS) analysis. It showed high uniformity and endurance performance up to 10(8) switching cycles, including a lower power consumption. The excellent electrical performance can be attributed to the role of a series resistor of ITO because the adverse effects of the voltage (or current) overshooting can be efficiently suppressed, resulting in the controllability of the In CF formation and rupture. The XPS depth profile results confirmed the oxygen exchange at the TaOx/ITO interface, combined with the Ohmic conduction mechanism at low resistance state, indicating that the ITO interface acts as the series resistor rather than the Schottky barrier.
引用
收藏
页数:6
相关论文
共 13 条
  • [1] The effect of high resistivity AlOδ layer on low-power consumption of TaOx based resistive switching memory
    Zhao, Jin Shi
    Wang, Chen
    Yan, Yu
    Chen, Yu Ting
    Sun, Wen Tao
    Li, Jun Ye
    Wang, Xiang Yu
    Mi, Wei
    Song, Dian You
    Zhou, Li Wei
    VACUUM, 2020, 174
  • [2] Configurable ultra-low operating voltage resistive switching between bipolar and threshold behaviors for Ag/TaOx/Pt structures
    Huang, Xu
    Jiang, Kang'an
    Niu, Yiru
    Wang, Renzhi
    Zheng, Diyuan
    Dong, Anhua
    Dong, Xinyuan
    Mei, Chunlian
    Lu, Jing
    Liu, Shuai
    Gan, Zhikai
    Zhong, Ni
    Wang, Hui
    APPLIED PHYSICS LETTERS, 2018, 113 (11)
  • [3] Microscopic origin of read current noise in TaOx-based resistive switching memory by ultra-low temperature measurement
    Pan, Yue
    Cai, Yimao
    Liu, Yefan
    Fang, Yichen
    Yu, Muxi
    Tan, Shenghu
    Huang, Ru
    APPLIED PHYSICS LETTERS, 2016, 108 (15)
  • [4] Impact of Electroforming Current on Self-Compliance Resistive Switching in an ITO/Gd:SiOx/TiN Structure
    Tseng, Hsueh-Chih
    Chang, Ting-Chang
    Wu, Yi-Chun
    Wu, Sei-Wei
    Huang, Jheng-Jie
    Chen, Yu-Ting
    Yang, Jyun-Bao
    Lin, Tzu-Ping
    Sze, Simon. M.
    Tsai, Ming-Jinn
    Wang, Ying-Lang
    Chu, Ann-Kuo
    IEEE ELECTRON DEVICE LETTERS, 2013, 34 (07) : 858 - 860
  • [5] Low-power bipolar resistive switching TiN/HfO2/ITO memory with self-compliance current phenomenon
    Ye, Cong
    Zhan, Chao
    Tsai, Tsung-Ming
    Chang, Kuan-Chang
    Chen, Min-Chen
    Chang, Ting-Chang
    Deng, Tengfei
    Wang, Hao
    APPLIED PHYSICS EXPRESS, 2014, 7 (03)
  • [6] An x-band GaAs monolithic voltage controlled frequency divider with ultra-low DC power consumption
    Ohira, T
    Suzuki, Y
    Mizuno, H
    APMC 2001: ASIA-PACIFIC MICROWAVE CONFERENCE, VOLS 1-3, PROCEEDINGS, 2001, : 127 - 130
  • [7] Novel Defects-Trapping TaOX/HfOX RRAM With Reliable Self-Compliance, High Nonlinearity, and Ultra-Low Current
    Chen, Yu-Sheng
    Lee, Heng-Yuan
    Chen, Pang-Shiu
    Chen, Wei-Su
    Tsai, Kan-Hsueh
    Gu, Pei-Yi
    Wu, Tai-Yuan
    Tsai, Chen-Han
    Rahaman, S. Z.
    Lin, Yu-De
    Chen, Frederick
    Tsai, Ming-Jinn
    Ku, Tzu-Kun
    IEEE ELECTRON DEVICE LETTERS, 2014, 35 (02) : 202 - 204
  • [8] Low power/self-compliance of resistive switching elements modified with a conduction Ta-oxide layer through low temperature plasma oxidization of Ta thin film
    Chen, Yu-Sheng
    Lee, Heng-Yuan
    Chen, Pang-Shiu
    Lin, Y. D.
    Tsai, Kan-Hsueh
    Hsu, C. H.
    Chen, W. S.
    Tsai, Ming-Jinn
    Ku, T. K.
    Wang, P. H.
    2016 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA), 2016,
  • [9] Effect of current compliance and voltage sweep rate on the resistive switching of HfO2/ITO/Invar structure as measured by conductive atomic force microscopy
    Wu, You-Lin
    Liao, Chun-Wei
    Ling, Jing-Jenn
    APPLIED PHYSICS LETTERS, 2014, 104 (24)
  • [10] Effect of deposition temperature on ultra-low voltage resistive switching behavior of Fe-doped SrTiO3 films
    Jiang, Xue
    Wei, Minglong
    Chan, Cheuk Ho
    Wang, Yingyue
    Lai, Ruilian
    Wang, Jianbo
    Dai, Jiyan
    Qiu, Xiaoyan
    APPLIED PHYSICS LETTERS, 2020, 116 (10)