Analysis of substrate effect in chemically amplified resist on silicate-glass

被引：5
|
作者：
Mori, S [1 ]
Fukushima, T [1 ]
Sato, Y [1 ]
机构：
[1] SHARP CO LTD,CENT RES LABS,TENRI,NARA 632,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 12B期
关键词：
substrate effect; chemically amplified resist; BPSG substrate; electron spectroscopy for chemical analysis; cleaning with H2SO4/H2O2;
D O I：
10.1143/JJAP.35.6495
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The substrate effect of chemically amplified (CA) resists on boron-phosphorous-silicate-glass (BPSG), boron-silicate-glass (BSG), phosphorous-silicate-glass (PSG) and non-doped-silicate-glass (NSG) has been investigated using a surface analysis technique. The resist pattern of a negative-tone CA resist on BPSG, PSG and BSG substrates has an undercut profile, and that of a positive-tone CA resist on these substrates has a footing profile. To clarify the interaction between CA resists and BPSG, BSG, PSG and NSG substrates, the surface of these substrates was analyzed by electron spectroscopy for chemical analysis (ESCA). It was found that there are boron oxides and/or phosphorous oxides on the surface. These oxides are considered to contribute to the undercut profile of the negative resist and footing profile of the positive resist, and to quench photo-generated acids in the resists. Further, cleaning of the surface of a BPSG substrate with H2SO4/H2O2 is results in improvement of the pattern profile.
引用
收藏
页码：6495 / 6500
页数：6
相关论文
共 50 条
  • [1] Analysis of substrate effect in chemically amplified resist on silicate-glass
    Mori, Shigeyasu
    Fukushima, Takashi
    Sato, Yuichi
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (12 B): : 6347 - 6695
  • [2] Poly(siloxane)-based chemically amplified resist convertible into silicate glass
    Ito, Toshio, 1600, (32):
  • [3] POLY(SILOXANE)-BASED CHEMICALLY AMPLIFIED RESIST CONVERTIBLE INTO SILICATE GLASS
    ITO, T
    SAKATA, M
    ENDO, A
    JINBO, H
    ASHIDA, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12B): : 6052 - 6058
  • [4] Investigation of substrate-effect in chemically amplified resist
    Mori, S
    Watanabe, T
    Adachi, K
    Fukushima, T
    Uda, K
    Sato, Y
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIII, 1996, 2724 : 131 - 138
  • [5] Mechanism of Resist Heating Effect in Chemically Amplified Resist
    Ikari, Y.
    Okamoto, K.
    Maeda, N.
    Konda, A.
    Kozawa, T.
    Tamura, T.
    ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXVII, 2020, 11326
  • [6] STRENGTH AND FATIGUE OF SILICATE-GLASS
    HAHNERT, M
    GEHRKE, E
    ULLNER, C
    GLASTECHNISCHE BERICHTE-GLASS SCIENCE AND TECHNOLOGY, 1988, 61 (03): : N12 - N12
  • [7] Thermal effect study for a chemically amplified resist
    Kim, Sang-Kon
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2006, 49 (03) : 1211 - 1216
  • [8] Insight into silicate-glass corrosion mechanisms
    Cailleteau, Celine
    Angeli, Frederic
    Devreux, Francois
    Gin, Stephane
    Jestin, Jacques
    Jollivet, Patrick
    Spalla, Olivier
    NATURE MATERIALS, 2008, 7 (12) : 978 - 983
  • [9] NMR analysis of chemically amplified resist films
    Ito, H
    Sherwood, M
    MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 104 - 115
  • [10] Resist process issues related to the glass transition changes in chemically amplified resist films
    Raptis, I
    Niakoula, D
    Tegou, E
    Bellas, V
    Gogolides, E
    Argitis, P
    Papadokostaki, KG
    Ioannidis, A
    MICROELECTRONIC ENGINEERING, 2003, 67-8 : 283 - 291
12345