POSS-based Diblock Fluoropolymer for Self-assembled Hydrophobic Coatings

Linear/star-shaped polyhedral oligomeric silsesquioxane (POSS)-based fluorinated diblock copolymers are synthesized by octakis(dibromoethyl)-POSS (POSS-(Br)(16)) and aminopropylisobutyl-POSS (ap-POSS) initiating methylmethacrylate (MMA) and dodecafluoroheptylmethacrylate (DFHM), respectively. The effect of solvents on their self-assembled micelles, surface wetability and viscoelasticity of casted films, and the hydrophobic application are characterized. In THF, CHCl3 and dimethyl carbonate (DMC) solutions, the self-assembled micelles of star-shaped s-POSS-(PMMA-b-PDFHM)(16) are larger than linear-shaped ap-POSS-PMMA-b-PDFHM. CHCl3-casted surface gains the highest roughness, fluoride content, water contact angles, but the lowest water adsorption and viscoelasticity. CHCl3-micelles exhibit superhydrophobicity to stone and cotton fiber substrates. Therefore, POSS-based fluoropolymer is hoped to act as hydrophobic coatings. (C) 2016 Elsevier Ltd. All rights reserved.