Retention and photoclastic properties of two endodontic post systems.

被引:0
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作者
Pagnillo, MK [1 ]
Cohen, BI [1 ]
Musikant, BL [1 ]
Deutsch, AS [1 ]
机构
[1] ESSENTIAL DENT LABS,S HACKENSACK,NJ
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R78 [口腔科学];
学科分类号
1003 ;
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页码:553 / 553
页数:1
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