Pulsed techniques for the characterization of low-frequency dispersive effects in RF power FETs using a flexible measurement set-up

被引:3
|
作者
Gibiino, Gian Piero [1 ]
Santarelli, Alberto [1 ]
Traverso, Pier Andrea [1 ]
机构
[1] Univ Bologna, Dept Elect Elect & Informat Engn Guglielmo Marcon, I-40136 Bologna, Italy
关键词
Transistor characterization; Pulsed measurements; Network analysis; ON-SI HEMTS; TRAPPING DYNAMICS; GAN; PERFORMANCE; CALIBRATION; NVNA;
D O I
10.1016/j.measurement.2021.109240
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This work describes an on-wafer measurement architecture tailored to the broadband pulsed characterization of radio-frequency (RF) power field-effect transistors (FETs). Based on a 50-Omega environment and corresponding wave-variable domain representation, the set-up exploits the impedance matching and the broadband feature of its components, together with a full-bandwidth calibration, for the synthesis and measurement of pulsed waveforms with short pulse rise/fall times in the order of a few ns, while guaranteeing a reduced risk of oscillations. These measurement capabilities are particularly suited for experimentally assessing the FET performance reduction due to low-frequency dispersive effects caused by thermal and charge trapping phenomena. The flexibility of the set-up is showcased by discussing experimental examples of different measurement techniques in the kHz-to-GHz range, including single-and double-pulsed I-V characteristics and S-parameters, as well as pulsed continuous-wave (CW) measurements, performed on state-of-the-art gallium nitride (GaN) RF FETs for microwave and millimeter-wave applications.
引用
收藏
页数:13
相关论文
共 41 条
  • [31] A New Empirical Model for the Characterization of Low-Frequency Dispersive Effects in FET Electron Devices Accounting for Thermal Influence on the Trapping State
    Raffo, Antonio
    Vadala, Valeria
    Vannini, Giorgio
    Santarelli, Alberto
    2008 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-4, 2008, : 1428 - +
  • [32] Modeling and design of FETs in the temperature range from -50°C to +120°C oriented to low-power GaAs ICs CAD applying low-frequency design techniques
    Giorgio, A
    Perri, AG
    1997 2ND IEEE-CAS REGION 8 WORKSHOP ON ANALOG AND MIXED IC DESIGN, PROCEEDINGS, 1997, : 123 - 129
  • [33] Polymer-Based Piezoelectric Energy Harvester for Low-Frequency Vibration Using Frequency Up-Conversion Driven by Collision with a Flexible Beam
    Tsukamoto, T.
    Umino, Y.
    Hashikura, K.
    Shiomi, S.
    Yamada, K.
    Suzuki, T.
    18TH INTERNATIONAL CONFERENCE ON MICRO AND NANOTECHNOLOGY FOR POWER GENERATION AND ENERGY CONVERSION APPLICATIONS, 2019, 1407
  • [34] Relative Humidity Measurement of Air in Low-Temperature Ranges Using Low-Frequency Acoustic Waves and Correlation Signal Processing Techniques
    Guo, Miao
    Li, Yue
    Gao, Jingmin
    SENSORS, 2022, 22 (16)
  • [35] A fully calibrated NVNA set-up for linearity characterization of RF power devices using Unequally Spaced Multi-Tone signal through IM3 & IM5 measurements
    Gillet, Vincent
    Teyssier, Jean-Pierre
    Reveyrand, Tibault
    Laurent, Sylvain
    Prigent, Michel
    Quere, Raymond
    2018 91ST ARFTG MICROWAVE MEASUREMENT CONFERENCE (ARFTG): WIDEBAND MODULATED TEST SIGNALS FOR NETWORK ANALYSIS OF WIRELESS INFRASTRUCTURE BUILDING BLOCKS, 2018,
  • [36] Development of a low cost automated PC-based insertion loss measurement set-up using a simple source and detector in X-band
    Deka, JR
    Bhattacharyya, NS
    Bhattacharyya, S
    IETE TECHNICAL REVIEW, 2005, 22 (06) : 425 - 434
  • [37] Latent damage generation in thin oxides of metal-oxide-semiconductor devices under high-field impulse stress and damage characterization using low-frequency noise measurement
    Chim, WK
    Lim, PS
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (12): : 6770 - 6777
  • [38] Individual Effects of Various Plasma-Related Factors on the High Aspect Ratio Oxide Etching Process at Low-Frequency Bias Power Using an Inductively Coupled Plasma System
    Hye Jun Son
    Alexander Efremov
    Gilyoung Choi
    Kwang-Ho Kwon
    Plasma Chemistry and Plasma Processing, 2024, 44 : 635 - 649
  • [39] Individual Effects of Various Plasma-Related Factors on the High Aspect Ratio Oxide Etching Process at Low-Frequency Bias Power Using an Inductively Coupled Plasma System
    Son, Hye Jun
    Efremov, Alexander
    Choi, Gilyoung
    Kwon, Kwang-Ho
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2024, 44 (01) : 635 - 649
  • [40] Construction of a low-frequency high-power piezoelectric transformer with a specified step-up voltage transformation ratio using two identical bolt-clamped Langevin-type transducers
    Adachi, Kazunari
    Konno, Takuma
    Kosugi, Satoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (06)