Structural and optical characterization of InGaN/GaN multiple quantum wells grown by molecular beam epitaxy

被引:7
|
作者
Ng, HM
Moustakas, TD
Ludwig, KF
机构
[1] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[2] Boston Univ, Ctr Photon Res, Boston, MA 02215 USA
[3] Boston Univ, Dept Phys, Boston, MA 02215 USA
来源
关键词
D O I
10.1116/1.591403
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
InGaN/GaN multiple quantum wells (MQWs) were grown on (0001) sapphire substrates, which were first coated with thick GaN or AIN films, at relatively low temperatures (650 degrees C). At this growth temperature, we found by x-ray diffraction that the MQWs show distinct higher order superlattice peaks, indicating that the interfaces between wells and barriers are abrupt with little interdiffusion between the layers. However, photoluminescence and cathodoluminescence studies provide evidence that at such low growth temperatures, the inhomogeneities in the InGaN alloys are enhanced due to spinodal decomposition in these alloys. (C) 2000 American Vacuum Society. [S0734-211X(00)08203-2].
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收藏
页码:1457 / 1460
页数:4
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