Remarkable room-temperature magnetoresistance in silicon strip devices

被引:0
|
作者
Guo, Hui [1 ,2 ]
Cui, Lei [1 ,2 ]
Li, Yali [1 ,2 ]
Chen, Qiang [3 ,4 ]
Fan, Xiaolong [1 ,2 ]
Wang, Fangcong [1 ,2 ]
Li, Junshuai [1 ,2 ]
机构
[1] Lanzhou Univ, Minist Educ, Key Lab Magnetism & Magnet Mat, Key Lab Special Funct Mat & Struct Design, 222 South Tianshui Rd, Lanzhou 730000, Peoples R China
[2] Lanzhou Univ, Sch Phys Sci & Technol, 222 South Tianshui Rd, Lanzhou 730000, Peoples R China
[3] Xiamen Univ, Dept Elect Sci, Inst Electromagnet & Acoust, Xiamen 361005, Peoples R China
[4] Xiamen Univ, Fujian Prov Key Lab Plasma & Magnet Resonance, Xiamen 361005, Peoples R China
来源
基金
中国国家自然科学基金;
关键词
silicon strip devices; room temperature magnetoresistance; carrier scattering; NONSATURATING MAGNETORESISTANCE; SPINTRONICS; FUTURE;
D O I
10.1002/pssr.201600253
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, we report remarkable roomtemperature magne-toresistance (MR) in silicon strip devices. Saturating and non-saturating MRs can be realized based on the measuring con-figurations with one top contact and ten top contacts, respec-tively. Using the onetopcontact measurement, a saturating MR ratio of similar to 400% is obtained at an applied voltage of only 1.0 V when the magnetic field is larger than 0.8 T. While the non-saturating MR is achieved in the ten-top-contact measurement and the MR ratio is only similar to 155% for the 1.0 V applied voltage even under the magnetic field of 1.2 T. The differences for MR ratio values and change trends in these two measuring configurations are attributed to the enhanced Hall electric field with the increase of the top contact number.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Unravelling the mechanism of large room-temperature magnetoresistance in silicon
    Schoonus, J. J. H. M.
    Haazen, P. P. J.
    Swagten, H. J. M.
    Koopmans, B.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (18)
  • [2] Negative and Positive Magnetoresistance of Graphenes at Room-Temperature
    Yang, Huaichao
    Zhou, Haiqing
    Chen, Minjiang
    Qiu, Caiyu
    Yu, Fang
    Hu, Lijun
    Wang, Guangru
    Sun, Lianfeng
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2013, 13 (02) : 1125 - 1128
  • [3] ROOM-TEMPERATURE ANTIFERROMAGNETIC TUNNELING ANISOTROPIC MAGNETORESISTANCE
    Wang, Y. Y.
    Song, C.
    Cui, B.
    Wang, G. Y.
    Zeng, F.
    Pan, F.
    SPIN, 2013, 3 (01)
  • [4] GIANT ROOM-TEMPERATURE MAGNETORESISTANCE IN THE FERH ALLOY
    ALGARABEL, PA
    IBARRA, MR
    MARQUINA, C
    DELMORAL, A
    GALIBERT, J
    IQBAL, M
    ASKENAZY, S
    APPLIED PHYSICS LETTERS, 1995, 66 (22) : 3062 - 3064
  • [5] Room-temperature nonsaturating magnetoresistance of intrinsic bulk silicon in high pulsed magnetic fields
    Wu, L. H.
    Zhang, X.
    Vanacken, J.
    Schildermans, N.
    Wan, C. H.
    Moshchalkov, V. V.
    APPLIED PHYSICS LETTERS, 2011, 98 (11)
  • [6] Large magnetoresistance at room-temperature in small-molecular-weight organic semiconductor sandwich devices
    Mermer, Ö
    Veeraraghavan, G
    Francis, TL
    Wohlgenannt, M
    SOLID STATE COMMUNICATIONS, 2005, 134 (09) : 631 - 636
  • [7] ANISOTROPY OF TRANSVERSE MAGNETORESISTANCE IN CUBIC MAGNETITE AT ROOM-TEMPERATURE
    KOSTOPOULOS, D
    ALEXOPOULOS, K
    JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) : 1714 - 1715
  • [8] Electrically Controlled All-Antiferromagnetic Tunnel Junctions on Silicon with Large Room-Temperature Magnetoresistance
    Shi, Jiacheng
    Arpaci, Sevdenur
    Lopez-Dominguez, Victor
    Sangwan, Vinod K.
    Mahfouzi, Farzad
    Kim, Jinwoong
    Athas, Jordan G.
    Hamdi, Mohammad
    Aygen, Can
    Arava, Hanu
    Phatak, Charudatta
    Carpentieri, Mario
    Jiang, Jidong S.
    Grayson, Matthew A.
    Kioussis, Nicholas
    Finocchio, Giovanni
    Hersam, Mark C.
    Khalili Amiri, Pedram
    ADVANCED MATERIALS, 2024, 36 (24)
  • [9] PLASMA ANODIZATION OF SILICON AT ROOM-TEMPERATURE
    DIMITRIOU, P
    GOURRIER, S
    REVUE DE PHYSIQUE APPLIQUEE, 1981, 16 (08): : 419 - 424
  • [10] SILICON DEFORMATION DAMAGE AT ROOM-TEMPERATURE
    YANG, K
    SCHWUTTKE, GH
    KAPPERT, H
    JOURNAL OF ELECTRONIC MATERIALS, 1976, 5 (04) : 448 - 448