XPS applications in thin films research

被引：20
|
作者：
Geng, SJ [1 ]
Zhang, S [1 ]
Onishi, H [1 ]
机构：
[1] Nanyang Technol Univ, Sch Mech & Prod Engn, Singapore 639798, Singapore
来源：
MATERIALS TECHNOLOGY | 2002年 / 17卷 / 04期
关键词：
D O I：
10.1080/10667857.2002.11752992
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The applications of X-ray photoelectron spectroscopy (XPS) with emphasis on thin film composition, imaging and thickness measurements was discussed. In XPS, the non-destructive analysis and the destructive analysis are the two methods that can be used for composition variation with depth to thin films. XPS imaging for the elemental distribution of thin films offers information on uniformity of thin films and segregation of elements in the thin films.
引用
收藏
页码：234 / 240
页数：7
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