Adhesion force of polymeric three-dimensional microstructures fabricated by microstereolithography

被引：12
|
作者：
Wu, DM [1 ]
Fang, N [1 ]
Sun, C [1 ]
Zhang, X [1 ]
机构：
[1] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
来源：
APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 21期
关键词：
D O I：
10.1063/1.1522825
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The adhesion between microstructures represents a great challenge in reliability of polymeric three-dimensional structures fabricated by microstereolithography (muSL). During the evaporative releasing, the capillary force of the solvent causes the deformation and adhesion of the fabricated beams. We present a method to determine the adhesion force of polymeric microstructures fabricated by muSL. The test structures with parallel beams were fabricated and released from the liquid resin via evaporation. By measuring the relationship between the adhesion length and the geometry of the beams, the adhesion force between two 1,6-hexanediol diacrylate (HDDA) polymeric parallel beams is determined as gamma=72+/-5 mN/m. This simple method and the determined adhesion force provide a key in designing reliable polymeric microelectromechanical systems in preventing the stiction problem. (C) 2002 American Institute of Physics.
引用
收藏
页码：3963 / 3965
页数：3
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