Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation

被引:9
|
作者
Welzel, Th. [1 ]
Dunger, Th. [1 ]
Richter, F. [1 ]
机构
[1] Tech Univ Chemnitz, Inst Phys, D-09107 Chemnitz, Germany
来源
SURFACE & COATINGS TECHNOLOGY | 2006年 / 201卷 / 07期
关键词
reactive sputtering; magnetron; pulsed; magnesium ([D]); oxides;
D O I
10.1016/j.surfcoat.2006.08.003
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A pulsed magnetron deposition discharge in argon with different admixtures of oxygen as reactive component has been studied. The target material used was magnesium and the pulsed discharge was operated in metallic and reactive mode. The discharge evolution during each pulse has been characterised by the time-resolved Langmuir double probe and time-resolved optical emission spectroscopy. Charge carrier density and optical emission exhibit two more or less strong peaks at the beginning of the "on" phase, the second of which being the most dominant. The temporal development of the discharge is clearly different for the two discharge modes: in the reactive mode, the structures in the "on" phase except of the first maximum - significantly shift to shorter times compared to the metallic mode. This is suggested to be due to the much higher secondary electron emission coefficient (T) of MgO in comparison to Mg leading to increased ionisation starting with the second maximum. The first maximum, however, is attributed to residual electrons from the precedent pulse and is thus independent of the T coefficient. A significant feedback from the discharge to the power supply is observed by changes in the voltage waveform: the more efficient discharge development is accompanied by a sharper and lower peak in the voltage. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:3959 / 3963
页数:5
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