Brightness measurement of an electron impact gas ion source for proton beam writing applications

被引:8
|
作者
Liu, N. [1 ,2 ]
Xu, X. [1 ]
Pang, R. [1 ]
Raman, P. Santhana [1 ,2 ]
Khursheed, A. [2 ]
van Kan, J. A. [1 ]
机构
[1] Natl Univ Singapore, Dept Phys, Ctr Ion Beam Applicat, Singapore 117542, Singapore
[2] Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117583, Singapore
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 2016年 / 87卷 / 02期
关键词
18;
D O I
10.1063/1.4932005
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We are developing a high brightness nano-aperture electron impact gas ion source, which can create ion beams from a miniature ionization chamber with relatively small virtual source sizes, typically around 100 nm. A prototype source of this kind was designed and successively micro-fabricated using integrated circuit technology. Experiments to measure source brightness were performed inside a field emission scanning electron microscope. The total output current was measured to be between 200 and 300 pA. The highest estimated reduced brightness was found to be comparable to the injecting focused electron beam reduced brightness. This translates into an ion reduced brightness that is significantly better than that of conventional radio frequency ion sources, currently used in single-ended MeV accelerators. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:3
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