Control of grain size and crystallinity of poly-Si films on quartz by Al-induced crystallization

被引:24
|
作者
Chen, Junyi [1 ,2 ]
Suwardy, Joko [1 ,2 ]
Subramani, Thiyagu [1 ]
Jevasuwan, Wipakorn [1 ]
Takei, Toshiaki [1 ]
Toko, Kaoru [2 ]
Suemasu, Takeshi [2 ]
Fukata, Naoki [1 ,2 ]
机构
[1] Natl Inst Mat Sci, Int Ctr Mat Nanoarchitecton, Tsukuba, Ibaraki 3050044, Japan
[2] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
来源
CRYSTENGCOMM | 2017年 / 19卷 / 17期
关键词
ALUMINUM-INDUCED CRYSTALLIZATION; POLYCRYSTALLINE SILICON; SOLAR-CELLS; AMORPHOUS-SILICON; LAYER EXCHANGE; SEED LAYERS; GLASS; GROWTH; ORIENTATION; TRANSISTORS;
D O I
10.1039/c6ce02328b
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The crystalline properties of poly-Si films on quartz grown using Al-induced crystallization (AIC) were investigated. The orientation fraction and grain size were controlled by modulating the annealing temperature and sample thickness. The results confirmed the enhancement of (111)-orientation fractions and grain size by lowering the annealing temperature and reducing the thickness. The effects of both parameters, annealing temperature and thickness, on the growth process were investigated, as was the role of the Al layer. We successfully formed (111)-oriented grains up to 384 mu m in size at a rate of 99% in a 50 nm-thick sample annealed at 400 degrees C. Furthermore, the real applications of AIC poly-Si as a growth template were demonstrated through silicon thin-film and nanowire formation.
引用
收藏
页码:2305 / 2311
页数:7
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