Structural studies on MOCVD grown GaN and AlGaN using atomic force microscopy

被引:8
|
作者
Fareed, RSQ
Juodkazis, S
Chung, SH
Sugahara, T
Sakai, S
机构
[1] Univ Tokushima, Satellite Venture Business Lab, Tokushima 770, Japan
[2] Univ Tokushima, Dept Elect & Elect Engn, Tokushima 770, Japan
关键词
MOCVD; GaN and AlGaN; atomic force microscopy;
D O I
10.1016/S0254-0584(99)00234-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Surface morphology studies of GaN and AlGaN grown by metalorganic chemical vapor deposition (MOCVD) have been carried out using atomic force microscopy. The open core dislocation and steps connecting two threading dislocations of opposite direction are commonly observed in undoped and doped GaN. Structural studies on AlGaN epitaxial layers grown on undoped GaN revealed the formation of open-core dislocation with width upto 300 nm. The nanopipes originate From the threading dislocation formed due to large lattice mismatch between sapphire and GaN. The mismatch also leads to high strain in the epilayers resulting in cracking effect at the edges of the hexagonal V-type defect. The self organized quantum dots features on the smooth surface of AlGaN epilaxial layer exhibit the Stranski-Krastanov(SK) mode of island growth. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:260 / 264
页数:5
相关论文
共 50 条
  • [41] Annealing studies of AN capped, MOCVD grown GaN films
    Derenge, Michael A.
    Kirchner, Kevin W.
    Jones, Kenneth A.
    Suvarna, Puneet
    Shahedipour-Sandvik, Shadi
    SOLID-STATE ELECTRONICS, 2014, 101 : 23 - 28
  • [42] Optical property studies of GaN films grown by MOCVD
    Zhang, Rong
    Yang, Kai
    Qin, Linhong
    Shen, Bo
    Shi, Hongtao
    Zheng, Youdou
    Huang, Z.C.
    Chen, J.C.
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1997, 18 (02): : 91 - 96
  • [43] Photoluminescence and Raman studies of GaN films grown by MOCVD
    Luong Tien Tung
    Lin, K. L.
    Chang, E. Y.
    Huang, W. C.
    Hsiao, Y. L.
    Chiang, C. H.
    APCTP-ASEAN WORKSHOP ON ADVANCED MATERIALS SCIENCE AND NANOTECHNOLOGY (AMSN08), 2009, 187
  • [44] AlGaN/GaN multiple quantum wells grown by using atomic layer deposition technique
    Lo, Ming-Hua
    Li, Zhen-Yu
    Chen, Shih-Wei
    Hong, Jhih-Cang
    Lu, Ting-Chang
    Kuo, Hao-Chung
    Wang, Shing-Chung
    ADVANCES IN GAN, GAAS, SIC AND RELATED ALLOYS ON SILICON SUBSTRATES, 2008, 1068 : 101 - 106
  • [45] Nanoscale capacitance spectroscopy characterization of AlGaN/GaN heterostructure by current-sensing atomic force microscopy
    Zeng, Huizhong
    Sun, Haoming
    Luo, Wenbo
    Huang, Wen
    Wang, Zhihong
    Li, Yanrong
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (09)
  • [46] A study of 2DEG properties in AlGaN/GaN heterostructure using GaN/AlN superlattice as barrier layers grown by MOCVD
    Chen, Fangsheng
    Chen, Hong
    Deng, Zhen
    Lu, Taiping
    Fang, Yutao
    Jiang, Yang
    Ma, Ziguang
    He, Miao
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2015, 118 (04): : 1453 - 1457
  • [47] A study of 2DEG properties in AlGaN/GaN heterostructure using GaN/AlN superlattice as barrier layers grown by MOCVD
    Fangsheng Chen
    Hong Chen
    Zhen Deng
    Taiping Lu
    Yutao Fang
    Yang Jiang
    Ziguang Ma
    Miao He
    Applied Physics A, 2015, 118 : 1453 - 1457
  • [48] Effects of AlN and GaN low-temperature interlayers on the dislocation behaviour of AlGaN and GaN grown by MOCVD
    Makaronidis, G
    MeAleese, C
    Barnard, JS
    Humphreys, CJ
    MICROSCOPY OF SEMICONDUCTING MATERIALS 2003, 2003, (180): : 309 - 312
  • [49] Growth of GaN/AlN and AlGaN by MOCVD using triethylgallium and tritertiarybutylaluminium
    Ambacher, O
    Dimitrov, R
    Lentz, D
    Metzger, T
    Rieger, W
    Stutzmann, M
    JOURNAL OF CRYSTAL GROWTH, 1997, 170 (1-4) : 335 - 339
  • [50] Properties of MOCVD GaN/AlGaN heterostructures grown on polar and non-polar bulk GaN substrates
    Rudzinski, M.
    Kudrawiec, R.
    Kucharski, R.
    Dwilinski, R.
    Strupinski, W.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 10, NO 3, 2013, 10 (03): : 302 - 305