Investigation of a new approach to decompose two potent greenhouse gases:: Photoreduction of SF6 and SF5CF3 in the presence of acetone

被引：15

作者：

Huang, Li ^{[1
]}

Dong, Wenbo ^{[1
]}

Zhang, Renxi ^{[1
]}

Hou, Huiqi ^{[1
]}

机构：

[1] Fudan Univ, Inst Environm Studies, Shanghai 200433, Peoples R China

来源：

CHEMOSPHERE | 2007年 / 66卷 / 05期

基金：

中国国家自然科学基金;

关键词：

sulfur hexafluoride; trifluoromethyl sulfur pentafluoride; 184.9 nm irradiation; photoreduction; reductive radical;

D O I：

10.1016/j.chemosphere.2006.06.028

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

In this paper, we addressed the utilization of photochemical method as an innovative technology for the destruction and removal of two potent greenhouse gases, SF6 and SF5CF3. The destruction and removal efficiency (DRE) of the process was determined as a function of excitation wavelength, irradiation time, initial ratio of acetone to SF5X (X represented F or CF3) initial SF5X concentration, additive oxygen and water vapor concentration. A complete removal was achieved by a radiation period of 55 min and 120 min for SF6-CH3COCH3 system and SF5CF3-CH3COCH3 System respectively under 184.9 nm irradiation. Extra addition of water vapor can enhance DRE by approximately 6% points in both systems. Further studies with GC/MS and FT-IR proved that no hazardous products such as S2F10, SO2F2, SCF2, SOF4 were generated in this process. (c) 2006 Elsevier Ltd. All rights reserved.

引用

页码：833 / 840

页数：8

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