Highly flexible manufacturing technique for microelectrode array fabrication

被引：7

作者：

Fofonoff, T ^{[1
]}

Martel, S ^{[1
]}

Wiseman, C ^{[1
]}

Dyer, R ^{[1
]}

Hunter, I ^{[1
]}

Hatsopoulos, N ^{[1
]}

Donoghue, J ^{[1
]}

机构：

[1] MIT, BioInstrumentat Lab, Cambridge, MA 02139 USA

来源：

SECOND JOINT EMBS-BMES CONFERENCE 2002, VOLS 1-3, CONFERENCE PROCEEDINGS: BIOENGINEERING - INTEGRATIVE METHODOLOGIES, NEW TECHNOLOGIES | 2002年

关键词：

microelectrode array; electrical discharge machining (EDM); neural implant;

D O I：

10.1109/IEMBS.2002.1053191

中图分类号：

TP18 [人工智能理论];

学科分类号：

081104 ; 0812 ; 0835 ; 1405 ;

摘要：

A new technique for manufacturing microelectrode arrays is described and assessed. This technique uses wire Electrical Discharge Machining (wire EDM) to form detailed array structures from a single sample of solid metal. Chemical etching can then be used to increase the electrode aspect ratios. Electrode lengths of 5 mm, widths of 40 mum, and spacings of 250 mum have been fabricated using this technique. Arrays of electrodes of varying lengths can also be fabricated., For intracortical recording applications, the signal paths are isolated from one another by securing an insulating substrate.

引用

页码：2107 / 2108

页数：2

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