Oligomers of MORE: Molecular Organometallic Resists for EUV

被引：3
|
作者：
Hasan, Shaheen [1 ]
Murphy, Michael [1 ]
Weires, Maximilian [1 ]
Grzeskowiak, Steven [1 ]
Denbeaux, Greg [1 ]
Brainard, Robert L. [1 ]
机构：
[1] State Univ New York Polytech Inst, CNSE, 257 Fuller Rd, Albany, NY 12203 USA
来源：
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXVI | 2019年 / 10960卷
关键词：
D O I：
10.1117/12.2516010
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The EUV photoproducts of antimony carboxylate photoresists [R3Sb(O2CR')(2)] are used to evaluate a possible free radical exposure mechanism by studying the change in molecular weight distribution with dose. We demonstrate the redistribution of carboxylate ligands across the metal centers in solution and use this property to create a statistical mono-olefin resist system with blended solutions of olefinic and non-olefinic antimony compounds that limit crosslinking and improve solubility of the photoproducts. Through gel permeation chromatography (GPC) analysis, we demonstrate the formation of high molecular weight oligomers with exposure dose and provide further support for the free-radical polymerization mechanism.
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页数：9
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