Spin reorientation;
Spin transfer torque;
Perpendicular magnetic random memory;
Co/Ni multilayers;
Composite layers;
ANISOTROPY;
TORQUE;
FIELD;
D O I:
10.1016/j.matdes.2015.12.092
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Spin reorientation temperature (T-SR) is investigated in both layers, including Co/Ni multilayer and composite layer consisting of Co/Pt multilayer with CoFeB layer. The T-SR of both layers can be adjusted in a wide range, and the low T-SR is obtained in both layers. It is also suggested a writing method based on spin transfer torque (STT) with spin reorientation, for low current writing perpendicular magnetic random memory with high thermal stability. This method is to reorient the magnetization from a perpendicular to an in-plane state, which can be caused by Joule heating the MTJ with thermal barriers above T-SR by the injected current pulse. This polarized current can also produce the STT to push the magnetization toward a deterministic perpendicular direction from an in-plane state, when decreasing the magnitude of current pulse. Since the perpendicular anisotropy dominates magnetization switching during cooling, the critical current density is determined by the Joule heating for realization of spin reorientation in this writing method. Macrospin modeling shows the critical current density is 2 x 10(6) A/cm(2), which is two orders magnitude lower than that of conventional STT switching. This writing method can be applied to the perpendicular magnetic tunnel junction comprised of Co/Ni multilayer or composite layer. (C) 2015 Elsevier Ltd. All rights reserved.
机构:
IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Nowak, J. J.
Robertazzi, R. P.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Robertazzi, R. P.
Sun, J. Z.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Sun, J. Z.
Hu, G.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Hu, G.
Abraham, David W.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Abraham, David W.
Trouilloud, P. L.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Trouilloud, P. L.
Brown, S.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Brown, S.
Gaidis, M. C.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Gaidis, M. C.
O'Sullivan, E. J.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
O'Sullivan, E. J.
Gallagher, W. J.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
Gallagher, W. J.
Worledge, D. C.
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IBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USAIBM Corp, Thomas J Watson Res Ctr, IBM MagIC MRAM Alliance, Yorktown Hts, NY 10598 USA
机构:
Hanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South KoreaHanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South Korea
Beek, Jong-Ung
Jung, Sun-Hwa
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Hanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South KoreaHanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South Korea
Jung, Sun-Hwa
Jun, Han-Sol
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Hanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South KoreaHanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South Korea
Jun, Han-Sol
Ashiba, Kei
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Hanyang Univ, MRAM Ctr, Dept Elect & Comp Engn, Seoul 133791, South Korea
SUMCO Corp, Wafer Engn Dept, Saga 8494256, JapanHanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South Korea
Ashiba, Kei
Choi, Jin-Young
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Hanyang Univ, MRAM Ctr, Dept Elect & Comp Engn, Seoul 133791, South KoreaHanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South Korea
Choi, Jin-Young
Park, Jea-Gun
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Hanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South Korea
Hanyang Univ, MRAM Ctr, Dept Elect & Comp Engn, Seoul 133791, South KoreaHanyang Univ, MRAM Ctr, Dept Nanoscale Semicond Engn, Seoul 04763, South Korea