Investigation on Polishing of Zirconia Ceramics Using Magnetic Compound Fluid: Relationship Between Material Removal and Surface Roughness

被引:3
|
作者
Feng, Ming [1 ,2 ]
Wang, Youliang [3 ]
Wu, Yongbo [2 ]
机构
[1] Wenzhou Univ, Coll Mech & Elect Engn, Wenzhou 325035, Zhejiang, Peoples R China
[2] Southern Univ Sci & Technol, Dept Mech & Energy Engn, Shenzhen, Peoples R China
[3] Lanzhou Univ Technol, Sch Mech & Elect Engn, Lanzhou, Peoples R China
基金
中国国家自然科学基金;
关键词
MCF slurry; zirconia ceramics; polishing; precision;
D O I
10.20965/IJAT.2021.P0017
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Zirconia ceramics have excellent applicability in the aerospace, defense, new energy, automotive, electronics, and biomedical fields. However, few investigations have been conducted on the high-precision polishing of zirconia ceramics. In this work, a polishing method using a magnetic compound fluid slurry is proposed. First, the principle and the constructed experimental setup were presented. Then, the experiments were performed that characterized the surface profile after polishing, the effect of the working gap, and the effect of the concentration of carbonyl iron particles (CIPs) on the material removal and surface quality. The results showed that the material removal ability correlated positively with the surface roughness; the smallest working gap (0.5 mm) induced greater material removal ability and better surface roughness; higher CIP concentration enabled a higher polishing force to obtain higher material removal and better surface quality. The polishing results show that surface roughness Rz of 55 nm was obtained at the surfaces of zirconia ceramics, confirming that the proposed method has the potential for polishing of zirconia ceramics.
引用
收藏
页码:17 / 23
页数:7
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