1200 nm highly strained GaInAs/GaAs surface emitting lasers

被引:0
|
作者
Koyama, F [1 ]
Miyamoto, T [1 ]
Arai, M [1 ]
Kondo, T [1 ]
机构
[1] Tokyo Inst Technol, P&I Lab, Microsyst Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:271 / 272
页数:2
相关论文
共 50 条
  • [1] Sb surfactant effect on GaInAs/GaAs highly strained quantum well lasers emitting at 1200 nm range grown by molecular beam epitaxy
    Kageyama, T
    Miyamoto, T
    Ohta, M
    Matsuura, T
    Matsui, Y
    Furuhata, T
    Koyama, F
    JOURNAL OF APPLIED PHYSICS, 2004, 96 (01) : 44 - 48
  • [2] Modulation characteristics of highly strained 1100 nm GaInAs/GaAs vertical cavity surface emitting laser on GaAs (311)B
    Arai, M
    Nishiyama, N
    Azuchi, M
    Matsutani, A
    Koyama, F
    Iga, K
    CLEO(R)/PACIFIC RIM 2001, VOL II, TECHNICAL DIGEST, 2001, : 610 - 611
  • [3] Diode Lasers Emitting at 1190 nm with a Highly Strained GaInAs Quantum Well and GaAsP Compensating Layers MOCVD-grown on a GaAs Substrate
    Vinokurov, D. A.
    Nikolaev, D. N.
    Pikhtin, N. A.
    Stankevich, A. L.
    Shamakhov, V. V.
    Bondarev, A. D.
    Rudova, N. A.
    Tarasov, I. S.
    SEMICONDUCTORS, 2011, 45 (09) : 1227 - 1230
  • [4] Diode lasers emitting at 1220 nm with a highly strained GaInAs quantum well and GaAsP compensating layers MOCVD-grown on a GaAs substrate
    Vinokurov, D. A.
    Kapitonov, V. A.
    Nikolaev, D. N.
    Pikhtin, N. A.
    Stankevich, A. L.
    Shamakhov, V. V.
    Bondarev, A. D.
    Vavilova, L. S.
    Tarasov, I. S.
    SEMICONDUCTORS, 2011, 45 (10) : 1364 - 1368
  • [5] Diode lasers emitting at 1220 nm with a highly strained GaInAs quantum well and GaAsP compensating layers MOCVD-grown on a GaAs substrate
    D. A. Vinokurov
    V. A. Kapitonov
    D. N. Nikolaev
    N. A. Pikhtin
    A. L. Stankevich
    V. V. Shamakhov
    A. D. Bondarev
    L. S. Vavilova
    I. S. Tarasov
    Semiconductors, 2011, 45 : 1364 - 1368
  • [6] Diode lasers emitting at 1190 nm with a highly strained GaInAs quantum well and GaAsP compensating layers MOCVD-grown on a GaAs substrate
    D. A. Vinokurov
    D. N. Nikolaev
    N. A. Pikhtin
    A. L. Stankevich
    V. V. Shamakhov
    A. D. Bondarev
    N. A. Rudova
    I. S. Tarasov
    Semiconductors, 2011, 45 : 1227 - 1230
  • [7] Low threshold current density operation of 1.16 μm highly strained GaInAs/GaAs vertical cavity surface emitting lasers on (100) GaAs substrate
    Kondo, T
    Arai, M
    Azuchi, M
    Uchida, T
    Matsutani, A
    Miyamoto, T
    Koyama, F
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2002, 41 (5B): : L562 - L564
  • [8] Wavelength extension effect on lasing characteristics of highly-strained GaInAs/GaAs vertical-cavity surface-emitting lasers with cavity detuning
    Takeda, Kazutaka
    Miyamoto, Tomoyuki
    Kondo, Takashi
    Uchiyama, Yasuhiro
    Kitabayashi, Naoto
    Uchida, Takeshi
    Matsutani, Akihiro
    Koyama, Fumio
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (8B): : 6691 - 6696
  • [9] Growth of highly strained GaInAs/GaAs quantum wells for 1.2 μm wavelength lasers
    Schlenker, D
    Miyamoto, T
    Chen, Z
    Koyama, F
    Iga, K
    JOURNAL OF CRYSTAL GROWTH, 2000, 209 (01) : 27 - 36
  • [10] Lasing characteristics of 1.2 μm highly strained GaInAs/GaAs quantum well lasers
    Kondo, T.
    Schlenker, D.
    Miyamoto, T.
    Chen, Z.
    Kawaguchi, M.
    Gouardes, E.
    Koyama, F.
    Iga, K.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (2 A): : 467 - 471