Influence of Abrasive on Planarization Polishing with the Tiny-grinding Wheel Cluster Based on the Magnetorheological Effect

被引:2
|
作者
Yan, Qiusheng [1 ]
Yang, Yong [1 ]
Lu, Jiabin [1 ]
Gao, Weiqiang [1 ]
机构
[1] Guangdong Univ Technol, Fac Electromech Engn, Guangzhou, Guangdong, Peoples R China
来源
关键词
Tiny-grinding wheel cluster; Magnetorheological effect; Semi-bounded abrasives; Material removal; PLATE;
D O I
10.4028/www.scientific.net/AMR.76-78.229
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Experiments were conducted to polish optical glass with the magnetorheological (MR) effect-based tiny-grinding wheel cluster, and the influences of abrasive material, particle size and content on the material removal rate and surface roughness are investigated. The experimental results indicate that: the higher the hardness of abrasives, the higher the material removal rate, but the abrasives with lower hardness can obtain lower surface roughness. The better polishing quality of the workpiece can be obtained when the particle size of abrasives is similar to the particle size of magnetic particles. Moreover, the content of abrasives has an optimum value, and the material removal rate and the surface quality can not be improved further when the content of abrasives exceeds the optimum value. On the basis of above, the material removal model of the new planarization polishing technique is presented.
引用
收藏
页码:229 / 234
页数:6
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