Pulsed-laser deposited amorphous-like PZT thin-films: Microstructure and optical properties

被引:2
|
作者
Lappalainen, J. [1 ]
Puustinen, J. [1 ]
Hiltunen, J. [2 ]
Lantto, V. [1 ]
机构
[1] Univ Oulu, EMPART Res Grp Infotech Oulu, Microelect & Mat Phys Labs, FIN-90570 Oulu, Finland
[2] VTT Tech Res Ctr Finland, FIN-90571 Oulu, Finland
关键词
Films; Amorphous; Optical properties; PZT; CRYSTALLIZATION;
D O I
10.1016/j.jeurceramsoc.2009.06.029
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Amorphous lead-zirconate-titanate (Pb0.97Nd0.02(Zr0.55Ti0.45)O-3, PNZT) thin-films were grown on single-crystal MgO(1 0 0) substrates at room temperature by pulsed laser deposition (PLD). Part of PNZT films was left as-deposited amorphous and others were post-annealed at temperatures from 100 to 400 degrees C. X-ray diffraction (XRD) and scanning probe rnicroscopy(SPM) were used to characterize the microstructure. Optical properties were analyzed using spectrophotometry at UV-vis-NIR and prism-coupler method at 633 nm wavelengths. Initially, films were amorphous with a broad XRD peak around 2 theta approximate to 29.7 degrees. As the post-annealing temperature increased above 250 degrees C, the amorphous peak started to shift towards lower 20-angles and got narrower indicating of decreasing interatomic spacing and possible glass transformation. At the same time, the transmittance at all wavelengths increased remarkably, although no crystal structure was detected by XRD. Also, sharp optical TE0 modes with full-width half-maximum (FWHM) values of Delta beta approximate to 0.00067 could be coupled into these films. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码:497 / 502
页数:6
相关论文
共 50 条
  • [1] Electrical properties and microstructure of lead zirconate titanate (PZT) thin films deposited by pulsed-laser deposition
    Wang, ZJ
    Kokawa, H
    Maeda, R
    [J]. CERAMICS INTERNATIONAL, 2004, 30 (07) : 1529 - 1533
  • [2] Optical properties of pulsed-laser deposited ZnO thin films
    Bazavan, R.
    Ion, L.
    Socol, G.
    Enculescu, I.
    Bazavan, D.
    Tazlaoanu, C.
    Lorinczi, A.
    Mihailescu, I. N.
    Popescu, M.
    Antohe, S.
    [J]. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2009, 11 (04): : 425 - 428
  • [3] Optical properties of pulsed-laser deposited BaTiO3 thin films
    Xu, J
    Durisin, DP
    Auner, GW
    [J]. Photon Processing in Microelectronics and Photonics IV, 2005, 5713 : 305 - 310
  • [4] ORIENTED ALUMINUM NITRIDE THIN-FILMS DEPOSITED BY PULSED-LASER ABLATION
    NORTON, MG
    KOTULA, PG
    CARTER, CB
    [J]. JOURNAL OF APPLIED PHYSICS, 1991, 70 (05) : 2871 - 2873
  • [5] PULSED-LASER DEPOSITION OF BATIO3 THIN-FILMS AND THEIR OPTICAL-PROPERTIES
    KIM, DH
    KWOK, HS
    [J]. APPLIED PHYSICS LETTERS, 1995, 67 (13) : 1803 - 1805
  • [6] SURFACE-MORPHOLOGY OF PULSED-LASER DEPOSITED ALUMINUM NITRIDE THIN-FILMS
    KOTULA, PG
    CARTER, CB
    NORTON, MG
    [J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 1994, 13 (17) : 1275 - 1277
  • [7] PULSED-LASER DEPOSITION CREATES THIN-FILMS
    HOBBS, JR
    [J]. LASER FOCUS WORLD, 1993, 29 (11): : 34 - &
  • [8] PULSED-LASER DEPOSITION OF NBTEX THIN-FILMS
    GRANGEON, F
    SASSOLI, H
    MATHEY, Y
    AUTRIC, M
    PAILHAREY, D
    MARINE, W
    [J]. APPLIED SURFACE SCIENCE, 1995, 86 (1-4) : 160 - 164
  • [9] THE PULSED-LASER DEPOSITION OF SUPERCONDUCTING THIN-FILMS
    SINGH, RK
    NARAYAN, J
    [J]. JOM-JOURNAL OF THE MINERALS METALS & MATERIALS SOCIETY, 1991, 43 (03): : 13 - 20
  • [10] Structure and properties of pulsed-laser deposited carbon nitride thin films
    Riascos, H
    Neidhardt, J
    Radnóczi, GZ
    Emmerlich, J
    Zambrano, G
    Hultman, L
    Prieto, P
    [J]. THIN SOLID FILMS, 2006, 497 (1-2) : 1 - 6