Controlled growth of 15R-SiC single crystals by the modified Lely method

被引:0
|
作者
Schulze, N [1 ]
Barrett, D [1 ]
Pensl, G [1 ]
机构
[1] Univ Erlangen Nurnberg, Inst Angew Phys, D-91058 Erlangen, Germany
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D O I
10.1002/1521-396X(200004)178:2<645::AID-PSSA645>3.3.CO;2-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bulk single crystals of the 15R-polytype of SiC have been grown by the sublimation physical-vapor-transport technique. 15R-SiC crystal growth was stabilized on a 15R-SiC seed using near-thermal-equilibrium growth conditions and a stoichiometric SiC sublimation source material. The polarity of the seed surface is shown to be an important factor in preparation of the 15R-polytype. The dual seed method (simultaneous growth on the Si- and C-face) was employed to demonstrate that 15R-polytype growth occurred only on the Si-face, while 6H- and 4H-polytype growth occurred on the C-face. The incorporation of nitrogen donors and boron accepters was also shown to be a function of seed polarity, with nitrogen incorporation on the C-face two times that on the Si-face, and boron incorporation on the C-face one-half that on the Si-face.
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页码:645 / 650
页数:6
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