Plasma-assisted electrospray deposition of thin elastomer films

被引:3
|
作者
Hashimoto, Kohei [1 ]
Takehara, Hiroaki [1 ,2 ]
Ichiki, Takanori [1 ,2 ]
机构
[1] Univ Tokyo, Sch Engn, Dept Mat Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo, Japan
[2] Innovat Ctr NanoMed iCONM, 3-25-14 Tonomachi, Kawasaki, Kanagawa, Japan
基金
日本科学技术振兴机构;
关键词
31;
D O I
10.7567/1347-4065/ab0ff7
中图分类号
O59 [应用物理学];
学科分类号
摘要
To facilitate the printing of high-viscosity materials on an insulating substrate, electrospray deposition (ESD) with the combinative use of corona discharge has been studied. The poly(dimethylsiloxane) (PDMS) solution was sprayed on a glass substrate by applying a high voltage in the range of -10 to +10 kV on the nozzle, and corona or streamer discharge was generated at voltages over +/- 6 kV. Visualization of the plume trajectory revealed that the charge accumulation occurred on the glass surface during the ESD and it can be neutralized by inflow of electrons from the plasma under certain conditions. Thus, the plasma-assisted ESD is a promising approach to overcome the main difficulty of charge build-up during ESD on insulator substrates and enables continuous deposition of PDMS droplets on the glass substrate. (c) 2019 The Japan Society of Applied Physics
引用
收藏
页数:6
相关论文
共 50 条
  • [41] PLASMA-ASSISTED METALORGANIC CHEMICAL VAPOR-DEPOSITION OF ZNSE FILMS
    MINO, N
    KOBAYASHI, M
    KONAGAI, M
    TAKAHASHI, K
    JOURNAL OF APPLIED PHYSICS, 1986, 59 (06) : 2216 - 2221
  • [42] Modeling plasma-assisted deposition of diamond-like carbon films
    Cavallotti, C
    Masi, M
    Carra, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (12) : 4332 - 4341
  • [43] Growth of Semiconducting Diamond Films by Plasma-Assisted Vapor Deposition..
    Sato, Y.
    Kamo, M.
    Setaka, N.
    Ceramurgia, 1988, 18 (02): : 84 - 87
  • [44] Surface modification of paper and cellulose by plasma-assisted deposition of fluorocarbon films
    Vaswani, S
    Koskinen, J
    Hess, DW
    SURFACE & COATINGS TECHNOLOGY, 2005, 195 (2-3): : 121 - 129
  • [45] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF CERAMIC FILMS AND COATINGS
    DAVIS, RF
    PROCESSING SCIENCE OF ADVANCED CERAMICS, 1989, 155 : 213 - 225
  • [46] Plasma-assisted physical vapour deposition
    Mackowski, J.M., 1600, (44):
  • [47] PLASMA-ASSISTED DEPOSITION AND EPITAXY OF ZNSE
    SATO, H
    OSADA, O
    MATSUSHITA, K
    HARIU, T
    SHIBATA, Y
    VACUUM, 1986, 36 (1-3) : 133 - 137
  • [48] Plasma-assisted deposition at atmospheric pressure
    Technische Universitaet Braunschweig, Salzgitter, Germany
    Surf Coat Technol, 1-2 (1-7):
  • [49] Plasma-assisted deposition at atmospheric pressure
    Salge, J
    SURFACE & COATINGS TECHNOLOGY, 1996, 80 (1-2): : 1 - 7
  • [50] REVIEW OF PLASMA-ASSISTED DEPOSITION PROCESSES
    RANDHAWA, H
    THIN SOLID FILMS, 1991, 196 (02) : 329 - 349